Inventor

KATAOKA SHOHEI

JP27 patents

⚠️ This page may combine multiple inventors who share the name “KATAOKA SHOHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KATAOKA SHOHEI

FUJIFILM CORP

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound

Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method

Pattern forming method, chemical amplification resist composition and resist film

Electrolytic solution for non-aqueous secondary battery, non-aqueous secondary battery, and metal complex

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film

Pattern forming method, method for manufacturing electronic device, and electronic device

Composition, article and their production method, and film and its production method

Electrolytic solution for non-aqueous secondary battery and non-aqueous secondary battery

Textile printing ink set and textile printing method

Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

M-phenylenediamine compound and method for producing polymer compound using same

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device

Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

KATAOKA SHOHEI

Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same

Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film

Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition

ITO TAKAYUKI

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same

Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same

KATO KEITA

Pattern forming method and resist composition

Method of forming pattern

YAMAGUCHI SHUHEI

Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition

IIZUKA YUSUKE

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition

TAKAHASHI HIDENORI

Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device

TSUCHIMURA TOMOTAKA

Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition

IWATO KAORU

Pattern forming method and resist composition

TANGO NAOHIRO

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same