Inventor
ENOMOTO YUICHIRO
JP27 patents
⚠️ This page may combine multiple inventors who share the name “ENOMOTO YUICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
14 patentsUS8933144B2Jan 13, 2015
Curable composition for imprint, pattern-forming method and pattern
FUJIFILM CORP50 citations94
US9263289B2Feb 16, 2016
Adhesion-promoting composition used between curable composition for imprints and substrate, and semiconductor device using the same
FUJIFILM CORP19 citations91
US9897922B2Feb 20, 2018
Method of forming pattern and developer for use in the method
FUJIFILM CORP10 citations83
US9663671B2May 30, 2017
Curable composition for imprints and method of storing the same
FUJIFILM CORP3 citations73
US9507263B2Nov 29, 2016
Underlay film composition for imprints and method of forming pattern and pattern formation method using the same
FUJIFILM CORP5 citations72
US9796803B2Oct 24, 2017
Under layer film-forming composition for imprints and method of forming pattern
FUJIFILM CORP4 citations71
US10248019B2Apr 2, 2019
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
FUJIFILM CORP1 citations62
US9482958B2Nov 1, 2016
Method of forming pattern and developer for use in the method
FUJIFILM CORP2 citations62
US9868846B2Jan 16, 2018
Curable composition for imprints, patterning method and pattern
FUJIFILM CORP1 citations52
US8753802B2Jun 17, 2014
Pattern forming method, chemical amplification resist composition and resist film
FUJIFILM CORP0 citations52
US10344177B2Jul 9, 2019
Under layer film-forming composition for imprints and method for forming pattern
FUJIFILM CORP0 citations51
US9862847B2Jan 9, 2018
Inkjet discharge method, pattern formation method, and pattern
FUJIFILM CORP1 citations51
US12422750B2Sep 23, 2025
Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device
FUJIFILM CORP0 citations50
US10175576B2Jan 8, 2019
Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device
FUJIFILM CORP0 citations41
ENOMOTO YUICHIRO
8 patentsUS8999621B2Apr 7, 2015
Pattern forming method, chemical amplification resist composition and resist film
ENOMOTO YUICHIRO4 citations72
US8911930B2Dec 16, 2014
Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern
ENOMOTO YUICHIRO2 citations62
US9097973B2Aug 4, 2015
Method of forming pattern and developer for use in the method
ENOMOTO YUICHIRO2 citations61
US9223219B2Dec 29, 2015
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
ENOMOTO YUICHIRO0 citations51
US8877828B2Nov 4, 2014
Method for producing curable composition for imprints
ENOMOTO YUICHIRO0 citations51
US8871642B2Oct 28, 2014
Method of forming pattern and developer for use in the method
ENOMOTO YUICHIRO0 citations51
US8820541B2Sep 2, 2014
Method for producing curable composition for imprints
ENOMOTO YUICHIRO0 citations51
US9116437B2Aug 25, 2015
Pattern forming method, chemical amplification resist composition and resist film
ENOMOTO YUICHIRO0 citations40