Inventor

NAM SANG KI

KR39 patents

⚠️ This page may combine multiple inventors who share the name “NAM SANG KI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NAM SANG KI

SAMSUNG ELECTRONICS CO LTD

Substrate processing apparatus

Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathode

Cleaning solution production systems and methods, and plasma reaction tanks

Plasma processing apparatus and method of manufacturing semiconductor device using the same

Method of manufacturing integrated circuit device

Plasma processing system, electron beam generator, and method of fabricating semiconductor device

Plasma generator, cleaning liquid processing apparatus, semiconductor device cleaning apparatus, cleaning liquid processing method, and method of manufacturing semiconductor device

Plasma processing apparatus and method, and method of manufacturing semiconductor device using the same

Plasma processing system, electron beam generator, and method of fabricating semiconductor device

Cleaning solution production systems and methods, and plasma reaction tanks

Apparatus and method for treating substrate

RF sensing apparatus of plasma processing chamber and plasma processing chamber including same

Plasma confinement ring, semiconductor manufacturing apparatus including the same, and method of manufacturing a semiconductor device using the same

Spectroscopic analysis method, method for fabricating semiconductor device using the same, and substrate process system using the same

APPLIED MATERIALS INC

Immersion field guided exposure and post-exposure bake process

Field guided post exposure bake application for photoresist microbridge defects

Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layer

Material modification by neutral beam source with selected collision angle

Field guided post exposure bake application for photoresist microbridge defects

Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake

Laser annealing and electric field

Plasma uniformity control by arrays of unit cell plasmas

Neutral beam source with plasma sheath-shaping neutralization grid

Resist sensitivity and profile improvement via acid anion control during field-guided post exposure bake

LAM RES CORP

Ion to neutral control for wafer processing with dual plasma source reactor

Multi zone gas injection upper electrode system

System, method and apparatus for generating pressure pulses in small volume confined process reactor

Heat transfer plate for a showerhead electrode assembly of a capacitively coupled plasma processing apparatus

Peripheral RF feed and symmetric RF return for symmetric RF delivery

Showerhead electrode assembly in a capacitively coupled plasma processing apparatus

Showerhead electrode assembly in a capacitively coupled plasma processing apparatus

NAM SANG KI

Chuck assembly for plasma processing

Peripheral RF feed and symmetric RF return for symmetric RF delivery

Methods and apparatus for selectively modifying RF current paths in a plasma processing system

Guard aperture to control ion angular distribution in plasma processing

Methods and apparatus for correcting for non-uniformity in a plasma processing system

NAM SANG-KI

Golf club with transparent grip

BISE RYAN

Multi zone gas injection upper electrode system

MARAKHTANOV ALEXEI

Dual zone temperature control of upper electrodes