Inventor

LEE YI-CHIA

TW38 patents

⚠️ This page may combine multiple inventors who share the name “LEE YI-CHIA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEE YI-CHIA

VERSUM MAT US LLC

Etching solution for selectively removing tantalum nitride over titanium nitride during manufacture of a semiconductor device

Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device

Etching solution having silicon oxide corrosion inhibitor and method of using the same

Etching solution for selectively removing silicon over silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device

Composition comprising three alkanolamines and a hydroxylamine for removing etch residues

Co/Cu selective wet etchant

Hafnium oxide corrosion inhibitor

Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device

Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ germanium stack during manufacture of a semiconductor device

Stripping compositions having high WN/W etching selectivity

Post etch residue cleaning compositions and methods of using the same

Etching composition and method for selectively removing silicon nitride during manufacture of a semiconductor device

Etching solution and method for selectively removing silicon nitride during manufacture of a semiconductor device

Etching solution for tungsten word line recess

Etching solution for tungsten and GST films

Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/silicon stack during manufacture of a semiconductor device

Etching compositions and methods for using same

Composition for TiN hard mask removal and etch residue cleaning

Compositions and methods for preventing collapse of high aspect ratio structures during drying

Stripper solutions and methods of using stripper solutions

Etching solution and method for aluminum nitride

TiN hard mask and etch residue removal

Copper corrosion inhibition system

Selective plasma enhanced atomic layer deposition

AIR PROD & CHEM

TiN hard mask and etch residual removal

Composition for titanium nitride hard mask and etch residue removal

Water-rich stripping and cleaning formulation and method for using same

Cleaning formulations

Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation

Stripper for dry film removal

Photoresist cleaning composition used in photolithography and a method for treating substrate therewith

TAIWAN SEMICONDUCTOR MFG CO LTD

Wafer level integrated MEMS device enabled by silicon pillar and smart cap

Wafer level integrated MEMS device enabled by silicon pillar and smart cap

Wafer level integrated MEMS device enabled by silicon pillar and smart cap

UNITED MICROELECTRONICS CORP

Method for fabricating a semiconductor device having improved hot carrier immunity ability

Method of cleaning a semiconductor substrate

WU AIPING

Cleaning formulations and method of using the cleaning formulations

RAO MADHUKAR BHASKARA

Water-rich stripping and cleaning formulation and method for using same