P

Inventor

CHAN BOON TEIK

BE48 patents
⚠️ This page may combine multiple inventors who share the name “CHAN BOON TEIK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IMEC VZW

45 patents
US9391141B2Jul 12, 2016

Method for producing fin structures of a semiconductor device in a substrate

IMEC VZW11 citations81
US10079145B2Sep 18, 2018

Method for pattern formation on a substrate, associated semiconductor devices, and uses of the method

IMEC VZW4 citations73
US11107812B2Aug 31, 2021

Method of fabricating stacked semiconductor device

IMEC VZW2 citations71
US10490442B2Nov 26, 2019

Method for blocking a trench portion

IMEC VZW2 citations71
US9899220B2Feb 20, 2018

Method for patterning a substrate involving directed self-assembly

IMEC VZW2 citations71
US10090393B2Oct 2, 2018

Method for forming a field effect transistor device having an electrical contact

IMEC VZW2 citations70
US11545401B2Jan 3, 2023

Isolated semiconductor layer stacks for a semiconductor device

IMEC VZW0 citations62
US11488826B2Nov 1, 2022

Self-aligned layer patterning

IMEC VZW0 citations62
US11335597B2May 17, 2022

Method for forming a buried metal line

IMEC VZW1 citations62
US11862452B2Jan 2, 2024

Contact isolation in semiconductor devices

IMEC VZW0 citations60
US11824122B2Nov 21, 2023

Method for filling a space in a semiconductor

IMEC VZW0 citations60
US11638391B2Apr 25, 2023

Method for processing a semiconductor device with two closely spaced gates

IMEC VZW0 citations57
US11527431B2Dec 13, 2022

Methods of semiconductor device processing

IMEC VZW0 citations54
US11056376B2Jul 6, 2021

Removing an organic sacrificial material from a two-dimensional material

IMEC VZW0 citations53
US12484289B2Nov 25, 2025

Method for forming a stacked transistor device

IMEC VZW0 citations52
US12324175B2Jun 3, 2025

FET device and a method for forming a FET device

IMEC VZW0 citations52
US11610980B2Mar 21, 2023

Method for processing a FinFET device

IMEC VZW0 citations52
US12154832B2Nov 26, 2024

Method for forming a semiconductor device and a semiconductor device

IMEC VZW0 citations51
US10978335B2Apr 13, 2021

Method for producing a gate cut structure on an array of semiconductor fins

IMEC VZW0 citations51
US9478611B2Oct 25, 2016

Vertical nanowire semiconductor structures

IMEC VZW1 citations51
US12520556B2Jan 6, 2026

Method for forming a semiconductor device

IMEC VZW0 citations50
US12457785B2Oct 28, 2025

Method for forming a stacked FET device

IMEC VZW0 citations50
US12237371B2Feb 25, 2025

Method for forming a semiconductor device

IMEC VZW0 citations50
US12237207B2Feb 25, 2025

Method for forming a buried metal line in a semiconductor substrate

IMEC VZW0 citations50
US11430697B2Aug 30, 2022

Method of forming a mask layer

IMEC VZW0 citations50
US10303048B2May 28, 2019

Metal of ceramic material hardened pattern

IMEC VZW0 citations50
US10153341B2Dec 11, 2018

Method of forming internal spacer for nanowires

IMEC VZW1 citations50
US9437488B2Sep 6, 2016

Metallization method for semiconductor structures

IMEC VZW0 citations50
US11854803B2Dec 26, 2023

Gate spacer patterning

IMEC VZW0 citations49
US11682591B2Jun 20, 2023

Method for forming transistor structures

IMEC VZW0 citations49
US11348842B2May 31, 2022

Split replacement metal gate integration

IMEC VZW0 citations49
US10192956B2Jan 29, 2019

Method for producing fin structures of a semiconductor device in a substrate

IMEC VZW0 citations49
US12527079B2Jan 13, 2026

Method for forming a stacked FET device

IMEC VZW0 citations47
US12446247B2Oct 14, 2025

Circuit cell for a standard cell semiconductor device

IMEC VZW0 citations47
US11430876B2Aug 30, 2022

Method for producing self-aligned gate and source/drain via connections for contacting a FET transistor

IMEC VZW0 citations47
US10493378B2Dec 3, 2019

Method of forming micro-pipes on a substrate and a structure formed thereof

IMEC VZW0 citations47
US12519015B2Jan 6, 2026

Conductive via formation connecting transistor structures in an integrated circuit

IMEC VZW0 citations43
US12513878B2Dec 30, 2025

Bit cell with isolating wall

IMEC VZW0 citations43
US10128371B2Nov 13, 2018

Self-aligned nanostructures for semiconductor devices

IMEC VZW0 citations41
US10825682B2Nov 3, 2020

Method for producing a pillar structure in a semiconductor layer

IMEC VZW0 citations40
US10784158B2Sep 22, 2020

Area-selective deposition of a tantalum silicide TaSix mask material

IMEC VZW0 citations40
US10782607B2Sep 22, 2020

Reticles for lithography

IMEC VZW0 citations40
US9905455B2Feb 27, 2018

Method for forming contact vias

IMEC VZW0 citations38
US10790382B2Sep 29, 2020

Method for forming horizontal nanowires and devices manufactured thereof

IMEC VZW0 citations36
US9548208B2Jan 17, 2017

Method for patterning an underlying layer

IMEC VZW0 citations34

IMEC

2 patents

CHAN BOON TEIK

1 patent