Inventor
RICE MICHAEL
US81 patents
⚠️ This page may combine multiple inventors who share the name “RICE MICHAEL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
36 patentsUS6573030B1Jun 3, 2003
Method for depositing an amorphous carbon layer
APPLIED MATERIALS INC1,317 citations98
US6165311ADec 26, 2000
Inductively coupled RF plasma reactor having an overhead solenoidal antenna
APPLIED MATERIALS INC98 citations98
US6077384AJun 20, 2000
Plasma reactor having an inductive antenna coupling power through a parallel plate electrode
APPLIED MATERIALS INC237 citations98
US6074512AJun 13, 2000
Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners
APPLIED MATERIALS INC236 citations98
US6054013AApr 25, 2000
Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density
APPLIED MATERIALS INC596 citations98
US7925377B2Apr 12, 2011
Cluster tool architecture for processing a substrate
APPLIED MATERIALS INC45 citations97
US6841341B2Jan 11, 2005
Method of depositing an amorphous carbon layer
APPLIED MATERIALS INC78 citations97
US6623596B1Sep 23, 2003
Plasma reactor having an inductive antenna coupling power through a parallel plate electrode
APPLIED MATERIALS INC84 citations97
US6238588B1May 29, 2001
High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process
APPLIED MATERIALS INC84 citations97
US6063233AMay 16, 2000
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna
APPLIED MATERIALS INC92 citations97
US6024826AFeb 15, 2000
Plasma reactor with heated source of a polymer-hardening precursor material
APPLIED MATERIALS INC100 citations97
US7743728B2Jun 29, 2010
Cluster tool architecture for processing a substrate
APPLIED MATERIALS INC36 citations96
US7694647B2Apr 13, 2010
Cluster tool architecture for processing a substrate
APPLIED MATERIALS INC42 citations96
US7223526B2May 29, 2007
Method of depositing an amorphous carbon layer
APPLIED MATERIALS INC50 citations96
US6444085B1Sep 3, 2002
Inductively coupled RF plasma reactor having an antenna adjacent a window electrode
APPLIED MATERIALS INC54 citations96
US6440221B2Aug 27, 2002
Process chamber having improved temperature control
APPLIED MATERIALS INC93 citations96
US6218312B1Apr 17, 2001
Plasma reactor with heated source of a polymer-hardening precursor material
APPLIED MATERIALS INC61 citations96
US5770099AJun 23, 1998
Plasma etch apparatus with heated scavenging surfaces
APPLIED MATERIALS INC54 citations96
US5477975ADec 26, 1995
Plasma etch apparatus with heated scavenging surfaces
APPLIED MATERIALS INC86 citations96
US7039501B2May 2, 2006
Method for determining a position of a robot
APPLIED MATERIALS INC95 citations95
US6524432B1Feb 25, 2003
Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density
APPLIED MATERIALS INC49 citations95
US6454898B1Sep 24, 2002
Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners
APPLIED MATERIALS INC43 citations95
US6365063B2Apr 2, 2002
Plasma reactor having a dual mode RF power application
APPLIED MATERIALS INC49 citations95
US5980194ANov 9, 1999
Wafer position error detection and correction system
APPLIED MATERIALS INC232 citations95
US5437757AAug 1, 1995
Clamp ring for domed pedestal in wafer processing chamber
APPLIED MATERIALS INC58 citations95
US7233841B2Jun 19, 2007
Vision system
APPLIED MATERIALS INC47 citations94
US6556887B2Apr 29, 2003
Method for determining a position of a robot
APPLIED MATERIALS INC46 citations94
US7335462B2Feb 26, 2008
Method of depositing an amorphous carbon layer
APPLIED MATERIALS INC24 citations92
US6514376B1Feb 4, 2003
Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna
APPLIED MATERIALS INC22 citations92
US6440866B1Aug 27, 2002
Plasma reactor with heated source of a polymer-hardening precursor material
APPLIED MATERIALS INC22 citations92
US6036877AMar 14, 2000
Plasma reactor with heated source of a polymer-hardening precursor material
APPLIED MATERIALS INC30 citations92
US5990017ANov 23, 1999
Plasma reactor with heated source of a polymer-hardening precursor material
APPLIED MATERIALS INC32 citations92
US5722668AMar 3, 1998
Protective collar for vacuum seal in a plasma etch reactor
APPLIED MATERIALS INC41 citations92
US7627395B2Dec 1, 2009
Vision system
APPLIED MATERIALS INC24 citations91
US5925212AJul 20, 1999
Apparatus and method for attaining repeatable temperature versus time profiles for plasma heated interactive parts used in mass production plasma processing
APPLIED MATERIALS INC43 citations90
US7374391B2May 20, 2008
Substrate gripper for a substrate handling robot
APPLIED MATERIALS INC9 citations83
ISHIKAWA TETSUYA
4 patentsUS8550031B2Oct 8, 2013
Cluster tool architecture for processing a substrate
ISHIKAWA TETSUYA13 citations92
US8215262B2Jul 10, 2012
Cluster tool architecture for processing a substrate
ISHIKAWA TETSUYA15 citations92
US8181596B2May 22, 2012
Cluster tool architecture for processing a substrate
ISHIKAWA TETSUYA15 citations92
US8146530B2Apr 3, 2012
Cluster tool architecture for processing a substrate
ISHIKAWA TETSUYA22 citations92
(unassigned)
3 patentsUS6797189B2Sep 28, 2004
Enhancement of silicon oxide etch rate and nitride selectivity using hexafluorobutadiene or other heavy perfluorocarbon
217 citations97
US6736931B2May 18, 2004
Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor
34 citations92
US6790311B2Sep 14, 2004
Plasma reactor having RF power applicator and a dual-purpose window
31 citations91
SOKUDO CO LTD
1 patentAPPLIED MATERIELS INC
1 patentL 3 COMM CORP
1 patentL3 COMM CORP
1 patentAPPLIED MATERIAL INC
1 patentSHEIKHZADEH-NADJAR HAMID
1 patentBIOLOGISTEX CCM LLC
1 patentShowing the top 50 of 81 patents by PatentIndex Score.