Inventor

LASKE FRANK

DE18 patents

⚠️ This page may combine multiple inventors who share the name “LASKE FRANK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LASKE FRANK

KLA TENCOR CORP

Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals

Metrology and control of overlay and edge placement errors

Systems and methods for device-correlated overlay metrology

Apparatus and method for the measurement of pattern placement and size of pattern and computer program therefor

Method and computer program product for controlling the positioning of patterns on a substrate in a manufacturing process

Method for correcting position measurements for optical errors and method for determining mask writer errors

Measurement of overlay and edge placement errors with an electron beam column array

Method for correcting position measurements for optical errors and method for determining mask writer errors

Method for measuring positions of structures on a substrate and computer program product for determining positions of structures on a substrate

Method for measuring positions of structures on a mask and thereby determining mask manufacturing errors

System and method for drift compensation on an electron beam based characterization tool

KLA CORP

Design-assisted large field of view metrology

Device feature specific edge placement error (EPE)

Multi-stage, multi-zone substrate positioning systems

Image modeling-assisted contour extraction

CHOI DONGSUB

Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability

KLA TENCOR MIE GMBH

Method for the reproducible determination of the position of structures on a mask with a pellicle frame

VISTEC SEMICONDUCTOR SYSTEM GMBH

Device and method for determining an optical property of a mask