Inventor

CONG ZHEPENG

US36 patents

⚠️ This page may combine multiple inventors who share the name “CONG ZHEPENG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CONG ZHEPENG

APPLIED MATERIALS INC

Thermal processing susceptor

Thermal processing susceptor

Susceptor support shaft with uniformity tuning lenses for EPI process

Susceptor design to reduce edge thermal peak

In-situ epi growth rate control of crystal thickness micro-balancing sensor

System and method to detect substrate and/or substrate support misalignment using imaging

Thermal processing susceptor

EPI self-heating sensor tube as in-situ growth rate sensor

Flat pocket susceptor design with improved heat transfer

In-situ film growth rate monitoring apparatus, systems, and methods for substrate processing

Thermal processing susceptor

Temperature calibration with band gap absorption method

Temperature calibration with band gap absorption method

Lamp infrared radiation profile control by lamp filament design and positioning

Liner for processing chamber

In-situ reflectometry for real-time process control

Overlap susceptor and preheat ring

Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging

Overlap susceptor and preheat ring

System and method for pedestal adjustment

Actively controlled gas inject for process temperature control

Process kits and related methods for processing chambers to facilitate deposition process adjustability

Process kits and related methods for processing chambers to facilitate deposition process adjustability

Substrate processing monitoring

Growth monitor system and methods for film deposition

Modular flow chamber kits, processing chambers, and related apparatus and methods applicable for semiconductor manufacturing

Process chamber

Methods, systems, and apparatus for monitoring radiation output of lamps

Thickness uniformity improvement kit for thermally sensitive epitaxial processing

Process kits and related methods for processing chambers to facilitate deposition process adjustability

Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamber

Temperature calibration with deposition and etch process

Susceptor improvement

Layer with discrete islands formed on a substrate support

COLLINS RICHARD O

System and method for pedestal adjustment

PATALAY KAILASH KIRAN

Non-contact substrate support position sensing system and corresponding adjustments