Inventor
KRULIK GERALD A
37 patents
⚠️ This page may combine multiple inventors who share the name “KRULIK GERALD A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED ELECTROLESS CONCEPTS I
8 patentsUS5318621AJun 7, 1994
Plating rate improvement for electroless silver and gold plating
APPLIED ELECTROLESS CONCEPTS I53 citations94
US5219484AJun 15, 1993
Solder and tin stripper compositions
APPLIED ELECTROLESS CONCEPTS I21 citations92
US5505872AApr 9, 1996
Solder stripper recycle and reuse
APPLIED ELECTROLESS CONCEPTS I24 citations91
US5232492AAug 3, 1993
Electroless gold plating composition
APPLIED ELECTROLESS CONCEPTS I30 citations91
US5212138AMay 18, 1993
Low corrosivity catalyst for activation of copper for electroless nickel plating
APPLIED ELECTROLESS CONCEPTS I40 citations91
US5524780AJun 11, 1996
Control of regeneration of ammoniacal copper etchant
APPLIED ELECTROLESS CONCEPTS I7 citations72
US5219815AJun 15, 1993
Low corrosivity catalyst containing ammonium ions for activation of copper for electroless nickel plating
APPLIED ELECTROLESS CONCEPTS I16 citations72
US5556553ASep 17, 1996
Recycle process for regeneration of ammoniacal copper etchant
APPLIED ELECTROLESS CONCEPTS I6 citations61
INTEGRATED PROCESS EQUIPMENT C
5 patentsUS6132586AOct 17, 2000
Method and apparatus for non-contact metal plating of semiconductor wafers using a bipolar electrode assembly
INTEGRATED PROCESS EQUIPMENT C168 citations98
US6121152ASep 19, 2000
Method and apparatus for planarization of metallized semiconductor wafers using a bipolar electrode assembly
INTEGRATED PROCESS EQUIPMENT C106 citations97
US5755614AMay 26, 1998
Rinse water recycling in CMP apparatus
INTEGRATED PROCESS EQUIPMENT C143 citations97
US5664990ASep 9, 1997
Slurry recycling in CMP apparatus
INTEGRATED PROCESS EQUIPMENT C233 citations97
US5855792AJan 5, 1999
Rinse water recycling method for semiconductor wafer processing equipment
INTEGRATED PROCESS EQUIPMENT C56 citations96
IONICS
5 patentsUS6582605B2Jun 24, 2003
Method of treating industrial waste waters
IONICS92 citations97
US6613230B2Sep 2, 2003
Method for simultaneous removal of arsenic and fluoride from aqueous solutions
IONICS85 citations95
US6723246B2Apr 20, 2004
Filter cleaning method
IONICS19 citations92
US6652758B2Nov 25, 2003
Simultaneous ammonia and fluoride treatment for wastewater
IONICS42 citations92
US6645385B2Nov 11, 2003
System and method for removal of fluoride from wastewater using single fluoride sensing electrode
IONICS42 citations87
THIOKOL MORTON INC
4 patentsUS4805553AFeb 21, 1989
Apparatus for bailout elimination and for enhancing plating bath stability in electrosynthesis/electrodialysis electroless copper purification process
THIOKOL MORTON INC10 citations74
US4719128AJan 12, 1988
Method of and apparatus for bailout elimination and for enhancing plating bath stability in electrosynthesis/electrodialysis electroless copper purification process
THIOKOL MORTON INC10 citations74
US4786393ANov 22, 1988
Leak-free plastic flow spacers for electrodialysis apparatus and a method for the making thereof
THIOKOL MORTON INC3 citations63
US4671861AJun 9, 1987
Measurement and control of net caustic production during electrodialysis
THIOKOL MORTON INC4 citations63
APPLIED CHEMICAL TECHNOLOGIES
2 patentsMORTON INT INC
2 patentsMCGEAN CHEMICAL CO THE
2 patentsUS4182784AJan 8, 1980
Method for electroless plating on nonconductive substrates using palladium/tin catalyst in aqueous solution containing a hydroxy substituted organic acid
MCGEAN CHEMICAL CO THE13 citations72
US4180480ADec 25, 1979
Catalytically active compositions from precious metal complexes
MCGEAN CHEMICAL CO THE4 citations57