Inventor
CHO CHAN-HYUNG
KR2 patents
Patents
2 patentsUS6858062B2Feb 22, 2005
Residual gas removing device and method thereof
SAMSUNG ELECTRONICS CO LTD3 citations59
US7018914B2Mar 28, 2006
Method of enlarging contact area of a gate electrode, semiconductor device having a surface-enlarged gate electrode, and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD4 citations57