Inventor

ISHIHARA SHUNICHI

JP71 patents

⚠️ This page may combine multiple inventors who share the name “ISHIHARA SHUNICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ISHIHARA SHUNICHI

CANON KK

Method for forming deposition film using Si compound and active species from carbon and halogen compound

Process for forming deposition film

Process for forming deposition film

Polycrystalline silicon semiconductor having an amorphous silicon buffer layer

Process for the formation of an amorphous silicon deposited film with intermittent irradiation of inert gas plasma

Apparatus for continuously preparing a light receiving element for use in photoelectromotive force member or image-reading photosensor

Process for forming deposited film

Process for the preparation of photoelectromotive force member

Formation of deposited film

Process for depositing a silicon-containing polycrystalline film on a substrate by way of growing Ge-crystalline nucleus

Process for forming deposited film

Device for forming a deposited film

Process for forming a deposited film from two mutually reactive active species

Functional ZnSe1-x Tex :H deposited film

Photovoltaic element with a semiconductor layer comprising non-single crystal material containing at least ZN, SE and H in an amount of 1 to 4 atomic %

Pin junction photovoltaic element with P or N-type semiconductor layer comprising non-single crystal material containing Zn, Se, H in an amount of 1 to 4 atomic % and a dopant and I-type semiconductor layer comprising non-single crystal Si(H,F) material

Pin junction photovoltaic element having I-type semiconductor layer comprising non-single crystal material containing at least Zn, Se and H in an amount of 1 to 4 atomic %

Process for forming deposited film including carbon as a constituent element

Functional ZnSe:H deposited films

Process for forming deposited film

Method for forming a deposited film

Process for forming deposited film

Process for forming deposited film

Process for forming deposited film

Process for forming a deposited film

Process for forming deposited film

Process for forming deposited film

Process for forming deposited film

Process for forming deposited film

Electrophotographic photosensitive member, process and apparatus for the preparation thereof

Apparatus for forming deposited film

Method for preparation of multi-layer structure film

Image signal processing method and apparatus therefor

Method for making a thin film transistor using a concentric inlet feeding system

Thin film polycrystalline solar cells and methods of forming same

Method for forming crystalline film employing localized heating of the substrate

PIN junction photovoltaic element containing Zn, Se, Te, H in an amount of 1 to 4 atomic %

Process for the preparation of image-reading photosensor

Deposition of polycrystal Si film

Silicon-containing deposited film

Process for the formation of an amorphous silicon deposited film with intermittent irradiation of inert gas plasma

Apparatus for forming deposited film

Process for forming deposited film from a group II through group VI metal hydrocarbon compound

Apparatus for forming a deposited film

Electrophotographic photosensitive member, process and apparatus for the preparation thereof

Deposited film forming process and deposited film forming device

Method for forming a multi-layer deposited film

Method for forming deposited film

Process for preparing a functional deposited film

ASAHI CHEMICAL IND

Coating composition for plastic substrates