Inventor
SEO HYEOUNG-WON
KR45 patents
⚠️ This page may combine multiple inventors who share the name “SEO HYEOUNG-WON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
38 patentsUS7368352B2May 6, 2008
Semiconductor devices having transistors with vertical channels and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD61 citations98
US7781285B2Aug 24, 2010
Semiconductor device having vertical transistor and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD22 citations92
US7586149B2Sep 8, 2009
Circuit device including vertical transistors connected to buried bitlines and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD34 citations92
US7279774B2Oct 9, 2007
Bulk substrates in FinFETs with trench insulation surrounding FIN pairs having FINs separated by recess hole shallower than trench
SAMSUNG ELECTRONICS CO LTD26 citations92
US7279775B2Oct 9, 2007
Semiconductor die with protective layer and related method of processing a semiconductor wafer
SAMSUNG ELECTRONICS CO LTD14 citations91
US8039896B2Oct 18, 2011
Semiconductor memory device with vertical channel formed on semiconductor pillars
SAMSUNG ELECTRONICS CO LTD8 citations84
US8022457B2Sep 20, 2011
Semiconductor memory device having vertical channel transistor and method for fabricating the same
SAMSUNG ELECTRONICS CO LTD13 citations84
US7759198B2Jul 20, 2010
Method of forming semiconductor devices having a vertical channel transistor
SAMSUNG ELECTRONICS CO LTD8 citations84
US7728373B2Jun 1, 2010
DRAM device with cell epitaxial layers partially overlap buried cell gate electrode
SAMSUNG ELECTRONICS CO LTD13 citations84
US7524733B2Apr 28, 2009
Asymmetric source/drain transistor employing selective epitaxial growth (SEG) layer and method of fabricating same
SAMSUNG ELECTRONICS CO LTD9 citations84
US7387931B2Jun 17, 2008
Semiconductor memory device with vertical channel transistor and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD12 citations84
US7247541B2Jul 24, 2007
Method of manufacturing a semiconductor memory device including a transistor
SAMSUNG ELECTRONICS CO LTD12 citations84
US7221023B2May 22, 2007
Asymmetric source/drain transistor employing selective epitaxial growth (SEG) layer and method of fabricating same
SAMSUNG ELECTRONICS CO LTD11 citations84
US7153733B2Dec 26, 2006
Method of fabricating fin field effect transistor using isotropic etching technique
SAMSUNG ELECTRONICS CO LTD14 citations84
US7619281B2Nov 17, 2009
Semiconductor device having buried gate line and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD8 citations83
US9224619B2Dec 29, 2015
Semiconductor device and fabricating method thereof
SAMSUNG ELECTRONICS CO LTD8 citations78
US7378320B2May 27, 2008
Method of forming asymmetric MOS transistor with a channel stopping region and a trench-type gate
SAMSUNG ELECTRONICS CO LTD8 citations74
US11088144B2Aug 10, 2021
Semiconductor device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD4 citations73
US7867825B2Jan 11, 2011
Semiconductor die with protective layer and related method of processing a semiconductor wafer
SAMSUNG ELECTRONICS CO LTD5 citations72
US8053307B2Nov 8, 2011
Method of fabricating semiconductor device with cell epitaxial layers partially overlap buried cell gate electrode
SAMSUNG ELECTRONICS CO LTD5 citations63
US7781851B2Aug 24, 2010
Semiconductor device having reduced die-warpage and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD6 citations63
US7776692B2Aug 17, 2010
Semiconductor device having a vertical channel and method of manufacturing same
SAMSUNG ELECTRONICS CO LTD3 citations63
US7557410B2Jul 7, 2009
Dynamic random access memory device
SAMSUNG ELECTRONICS CO LTD2 citations63
US7491603B2Feb 17, 2009
Transistors of semiconductor device having channel region in a channel-portion hole and methods of forming the same
SAMSUNG ELECTRONICS CO LTD5 citations63
US7482222B2Jan 27, 2009
Semiconductor device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD4 citations63
US11871559B2Jan 9, 2024
Semiconductor device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD0 citations62
US7888720B2Feb 15, 2011
Semiconductor device including conductive lines with fine line width and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD3 citations62
US7749846B2Jul 6, 2010
Method of forming contact structure and method of fabricating semiconductor device using the same
SAMSUNG ELECTRONICS CO LTD4 citations62
US7429505B2Sep 30, 2008
Method of fabricating fin field effect transistor using isotropic etching technique
SAMSUNG ELECTRONICS CO LTD2 citations62
US7393769B2Jul 1, 2008
Transistor of a semiconductor device having a punchthrough protection layer and methods of forming the same
SAMSUNG ELECTRONICS CO LTD3 citations62
US7354827B2Apr 8, 2008
Transistor having asymmetric channel region, semiconductor device including the same, and method of fabricating semiconductor device including the same
SAMSUNG ELECTRONICS CO LTD2 citations62
US7534708B2May 19, 2009
Recessed-type field effect transistor with reduced body effect
SAMSUNG ELECTRONICS CO LTD2 citations61
US7300845B2Nov 27, 2007
Method of manufacturing recess type MOS transistor having a dual diode impurity layer structure
SAMSUNG ELECTRONICS CO LTD3 citations61
US7952129B2May 31, 2011
Semiconductor devices having a vertical channel transistor
SAMSUNG ELECTRONICS CO LTD0 citations52
US7696570B2Apr 13, 2010
Transistors of semiconductor device having channel region in a channel-portion hole and methods of forming the same
SAMSUNG ELECTRONICS CO LTD0 citations52
US8873277B2Oct 28, 2014
Semiconductor memory device having balancing capacitors
SAMSUNG ELECTRONICS CO LTD0 citations51
US12048150B2Jul 23, 2024
Semiconductor memory device
SAMSUNG ELECTRONICS CO LTD0 citations50
US7659597B2Feb 9, 2010
Integrated circuit wire patterns including integral plug portions
SAMSUNG ELECTRONICS CO LTD0 citations42
SEO HYEOUNG-WON
5 patentsUS8895400B2Nov 25, 2014
Methods of fabricating semiconductor devices having buried word line interconnects
SEO HYEOUNG-WON16 citations82
US8283714B2Oct 9, 2012
Semiconductor memory device having vertical channel transistor and method for fabricating the same
SEO HYEOUNG-WON3 citations62
US8310859B2Nov 13, 2012
Semiconductor memory device having balancing capacitors
SEO HYEOUNG-WON2 citations61
US8482045B2Jul 9, 2013
Semiconductor memory device having vertical channel transistor and method for fabricating the same
SEO HYEOUNG-WON0 citations51
US8164119B2Apr 24, 2012
Semiconductor device including conductive lines with fine line width and method of fabricating the same
SEO HYEOUNG-WON1 citations50