Inventor
ARAMI JUNICHI
JP38 patents
⚠️ This page may combine multiple inventors who share the name “ARAMI JUNICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
27 patentsUS6156151ADec 5, 2000
Plasma processing apparatus
TOKYO ELECTRON LTD498 citations99
US5958140ASep 28, 1999
One-by-one type heat-processing apparatus
TOKYO ELECTRON LTD297 citations99
US5575853ANov 19, 1996
Vacuum exhaust system for processing apparatus
TOKYO ELECTRON LTD210 citations99
US5542559AAug 6, 1996
Plasma treatment apparatus
TOKYO ELECTRON LTD254 citations99
US6035804AMar 14, 2000
Process chamber apparatus
TOKYO ELECTRON LTD452 citations98
US5591269AJan 7, 1997
Vacuum processing apparatus
TOKYO ELECTRON LTD337 citations98
US5290381AMar 1, 1994
Plasma etching apparatus
TOKYO ELECTRON LTD116 citations98
US5275683AJan 4, 1994
Mount for supporting substrates and plasma processing apparatus using the same
TOKYO ELECTRON LTD122 citations98
US6014943AJan 18, 2000
Plasma process device
TOKYO ELECTRON LTD103 citations97
US5904872AMay 18, 1999
Heating device, method of manufacturing the same, and processing apparatus using the same
TOKYO ELECTRON LTD72 citations96
US5539179AJul 23, 1996
Electrostatic chuck having a multilayer structure for attracting an object
TOKYO ELECTRON LTD96 citations96
US5255153AOct 19, 1993
Electrostatic chuck and plasma apparatus equipped therewith
TOKYO ELECTRON LTD78 citations96
US5250137AOct 5, 1993
Plasma treating apparatus
TOKYO ELECTRON LTD87 citations96
US5240556AAug 31, 1993
Surface-heating apparatus and surface-treating method
TOKYO ELECTRON LTD75 citations96
US5221403AJun 22, 1993
Support table for plate-like body and processing apparatus using the table
TOKYO ELECTRON LTD60 citations96
US5938850AAug 17, 1999
Single wafer heat treatment apparatus
TOKYO ELECTRON LTD57 citations95
US5660671AAug 26, 1997
Magnetron plasma processing apparatus and processing method
TOKYO ELECTRON LTD49 citations95
US5618350AApr 8, 1997
Processing apparatus
TOKYO ELECTRON LTD27 citations93
US5234527AAug 10, 1993
Liquid level detecting device and a processing apparatus
TOKYO ELECTRON LTD39 citations93
US6764575B1Jul 20, 2004
Magnetron plasma processing apparatus
TOKYO ELECTRON LTD36 citations91
US7717061B2May 18, 2010
Gas switching mechanism for plasma processing apparatus
TOKYO ELECTRON LTD20 citations84
US7481902B2Jan 27, 2009
Substrate processing apparatus and method, high speed rotary valve and cleaning method
TOKYO ELECTRON LTD16 citations84
US5376211ADec 27, 1994
Magnetron plasma processing apparatus and processing method
TOKYO ELECTRON LTD14 citations81
US5387893AFeb 7, 1995
Permanent magnet magnetic circuit and magnetron plasma processing apparatus
TOKYO ELECTRON LTD16 citations72
US5474643ADec 12, 1995
Plasma processing apparatus
TOKYO ELECTRON LTD10 citations71
US7658801B2Feb 9, 2010
Heat treatment apparatus
TOKYO ELECTRON LTD6 citations63
US5888338AMar 30, 1999
Magnetron plasma processing apparatus and processing method
TOKYO ELECTRON LTD0 citations51
PIOTECH INC
5 patentsUS11437253B2Sep 6, 2022
Wafer pedestal with contact array
PIOTECH INC0 citations62
US11088012B2Aug 10, 2021
Wafer susceptor apparatus with thermal insulation and method for manufacturing the same
PIOTECH INC0 citations62
US12020975B2Jun 25, 2024
Apparatus and method for processing wafer
PIOTECH INC0 citations52
US11562891B2Jan 24, 2023
Method of temperature measurement used in radio-frequency processing apparatus for semiconductor
PIOTECH INC0 citations51
US11731145B2Aug 22, 2023
Multiple section showerhead assembly
PIOTECH INC0 citations44