Inventor
HIRAO TAKASHI
JP70 patents
⚠️ This page may combine multiple inventors who share the name “HIRAO TAKASHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD
30 patentsUS5814194ASep 29, 1998
Substrate surface treatment method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD134 citations99
US4859908AAug 22, 1989
Plasma processing apparatus for large area ion irradiation
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD230 citations99
US6207282B1Mar 27, 2001
Substrate surface treatment method
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD62 citations96
US5674366AOct 7, 1997
Method and apparatus for fabrication of dielectric thin film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD59 citations96
US5662965ASep 2, 1997
Method of depositing crystalline carbon-based thin films
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD70 citations96
US5203925AApr 20, 1993
Apparatus for producing a thin film of tantalum oxide
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD64 citations96
US5141885AAug 25, 1992
Method of fabrication of thin film transistors
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD56 citations96
US4800174AJan 24, 1989
Method for producing an amorphous silicon semiconductor device using a multichamber PECVD apparatus
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD103 citations95
US5719740AFeb 17, 1998
Capacitance sensor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD34 citations93
US5507080AApr 16, 1996
Method of manufacturing a capacitance sensor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD26 citations93
US5328855AJul 12, 1994
Formation of semiconductor diamond
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD27 citations93
US4980339ADec 25, 1990
Superconductor structure
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD33 citations93
US5766342AJun 16, 1998
Method for forming silicon film and silicon film forming apparatus
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD19 citations92
US5470398ANov 28, 1995
Dielectric thin film and method of manufacturing same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD50 citations92
US5431733AJul 11, 1995
Low vapor-pressure material feeding apparatus
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD30 citations92
US4861729AAug 29, 1989
Method of doping impurities into sidewall of trench by use of plasma source
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD51 citations92
US4624045ANov 25, 1986
Method of making thin film device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD46 citations91
US4143388AMar 6, 1979
Mos type semiconductor device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD36 citations90
US5672252ASep 30, 1997
Method and apparatus for fabrication of dielectric film
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD16 citations82
US4185291AJan 22, 1980
Junction-type field effect transistor and method of making the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD25 citations80
US6105225AAug 22, 2000
Method of manufacturing a thin film sensor element
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations74
US6083354AJul 4, 2000
Treatment method for diamonds
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US5612536AMar 18, 1997
Thin film sensor element and method of manufacturing the same
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD7 citations74
US5252174AOct 12, 1993
Method for manufacturing substrates for depositing diamond thin films
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations74
US5684574ANov 4, 1997
In-process film thickness monitoring system
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD16 citations73
US6127211AOct 3, 2000
Method of manufacturing transistor
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD10 citations72
US5070027ADec 3, 1991
Method of forming a heterostructure diode
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD11 citations72
US4770923ASep 13, 1988
Protection film structure for functional devices
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD13 citations72
US4492605AJan 8, 1985
Method of making photovoltaic device
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD14 citations69
US5976919ANov 2, 1999
Apparatus and method of manufacturing semiconductor element
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD4 citations63
KOCHI IND PROMOTION CT
5 patentsUS7993964B2Aug 9, 2011
Manufacturing method of semiconductor device including active layer of zinc oxide with controlled crystal lattice spacing
KOCHI IND PROMOTION CT214 citations98
US7598520B2Oct 6, 2009
Semiconductor device including active layer of zinc oxide with controlled crystal lattice spacing and manufacturing method thereof
KOCHI IND PROMOTION CT238 citations98
US7576394B2Aug 18, 2009
Thin film transistor including low resistance conductive thin films and manufacturing method thereof
KOCHI IND PROMOTION CT231 citations98
US7981734B2Jul 19, 2011
Manufacturing method of thin film transistor including low resistance conductive thin films
KOCHI IND PROMOTION CT90 citations97
US7977169B2Jul 12, 2011
Semiconductor device including active layer made of zinc oxide with controlled orientations and manufacturing method thereof
KOCHI IND PROMOTION CT125 citations97
AKIYAMA NOBORU
3 patentsUS8120345B2Feb 21, 2012
Semiconductor device and power supply using the same
AKIYAMA NOBORU23 citations92
US8901838B2Dec 2, 2014
Semiconductor device, LED driving circuit, and apparatus for displaying an image
AKIYAMA NOBORU13 citations83
US8125206B2Feb 28, 2012
Semiconductor device and power supply using the same
AKIYAMA NOBORU7 citations83
RENESAS ELECTRONICS CORP
2 patentsHITACHI LTD
2 patentsHIRAO TAKASHI
2 patentsHITACHI ASTEMO LTD
2 patentsFLOSFIA INC
1 patentHASHIMOTO TAKAYUKI
1 patentHITACHI AUTOMOTIVE SYSTEMS LTD
1 patentYONEZAWA SHINJI
1 patentShowing the top 50 of 70 patents by PatentIndex Score.