Inventor

FELDMANN HEIKO

DE58 patents

⚠️ This page may combine multiple inventors who share the name “FELDMANN HEIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FELDMANN HEIKO

ZEISS CARL SMT GMBH

Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same

Optical diffraction component for suppressing at least one target wavelength by destructive interference

Arrangement of a mirror

Projection lens with wavefront manipulator

Optical diffraction component for suppressing at least one target wavelength by destructive interference

Inspection device for masks for semiconductor lithography and method

Imaging optical arrangement to image an object illuminated by X-rays

Optical diffraction component

Illumination system or projection lens of a microlithographic exposure system

Apparatus and method for characterizing a microlithographic mask

Inspection device for masks for semiconductor lithography and method

Detection system for X-ray inspection of an object

Mirror and related EUV systems and methods

Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same

Optical device

Projection lens with wavefront manipulator

Projection objective of a microlithographic projection exposure apparatus

Projection objective and projection exposure apparatus including the same

Microlithography projection objective

Method for improving the imaging properties of a projection objective, and such a projection objective

Projection lens system of a microlithographic projection exposure installation

Microlithography projection objective

Optical arrangement for three-dimensionally patterning a material layer

ZEISS CARL SMT AG

Hologram and method of manufacturing an optical element using a hologram

Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatus

Projection exposure method and projection exposure apparatus for microlithography

Projection lens system of a microlithographic projection exposure installation

Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method

Projection objective for lithography

Projection objective and projection exposure apparatus including the same

Method for improving the imaging properties of a projection objective, and such a projection objective

Symmetrical objective having four lens groups for microlithography

FELDMANN HEIKO

Method of manufacturing a projection objective and projection objective

Method of manufacturing a projection objective and projection objective

Method and apparatus for structuring a radiation-sensitive material

Projection objective for lithography

Illumination system and projection objective of a mask inspection apparatus

TOTZECK MICHAEL

Microlithographic projection exposure apparatus

Microlithographic projection exposure apparatus

Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection

ROSTALSKI HANS-JUERGEN

Imaging microoptics for measuring the position of an aerial image

Imaging microoptics for measuring the position of an aerial image

ZEISS CARL SMS GMBH

Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection

PAZIDIS ALEXANDRA

Projection system with compensation of intensity variations and compensation element therefor

BUDACH MICHAEL

Method and apparatus for analyzing and/or repairing of an EUV mask defect

MUELLER RALF

Interference systems for microlithgraphic projection exposure systems

CONRADI OLAF

Method for improving the imaging properties of a projection objective, and such a projection objective

BEIERL HELMUT

Projection lens system of a microlithographic projection exposure installation

MANN HANS-JUERGEN

Magnifying imaging optical system and metrology system with an imaging optical system of this type

SCHUSTER KARL-HEINZ

Projection objective of a microlithographic projection exposure apparatus