Inventor
BEDER SUSANNE
DE32 patents
⚠️ This page may combine multiple inventors who share the name “BEDER SUSANNE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
14 patentsUS7385764B2Jun 10, 2008
Objectives as a microlithography projection objective with at least one liquid lens
ZEISS CARL SMT AG16 citations93
US7061626B1Jun 13, 2006
Method of manufacturing an optical element using a hologram
ZEISS CARL SMT AG29 citations92
US7301707B2Nov 27, 2007
Projection optical system and method
ZEISS CARL SMT AG20 citations86
US7848031B2Dec 7, 2010
Hologram and method of manufacturing an optical element using a hologram
ZEISS CARL SMT AG11 citations84
US7428105B2Sep 23, 2008
Objectives as a microlithography projection objective with at least one liquid lens
ZEISS CARL SMT AG9 citations84
US7782440B2Aug 24, 2010
Projection lens system of a microlithographic projection exposure installation
ZEISS CARL SMT AG8 citations83
US7728987B2Jun 1, 2010
Method of manufacturing an optical element
ZEISS CARL SMT AG10 citations83
US7570343B2Aug 4, 2009
Microlithographic projection exposure apparatus
ZEISS CARL SMT AG14 citations83
US7589903B2Sep 15, 2009
Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method
ZEISS CARL SMT AG7 citations74
US7835073B2Nov 16, 2010
Projection objective for lithography
ZEISS CARL SMT AG2 citations63
US7719658B2May 18, 2010
Imaging system for a microlithographical projection light system
ZEISS CARL SMT AG2 citations62
US7782538B2Aug 24, 2010
Projection objective having a high aperture and a planar end surface
ZEISS CARL SMT AG0 citations52
US7474469B2Jan 6, 2009
Arrangement of optical elements in a microlithographic projection exposure apparatus
ZEISS CARL SMT AG0 citations49
US7710640B2May 4, 2010
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT AG0 citations42
ZEISS CARL SMT GMBH
9 patentsUS10606048B2Mar 31, 2020
Imaging optical unit for a metrology system for examining a lithography mask
ZEISS CARL SMT GMBH3 citations71
US11119413B2Sep 14, 2021
Imaging optical unit for imaging an object field into an image field
ZEISS CARL SMT GMBH1 citations62
US8031326B2Oct 4, 2011
Illumination system or projection lens of a microlithographic exposure system
ZEISS CARL SMT GMBH3 citations62
US8908269B2Dec 9, 2014
Immersion catadioptric projection objective having two intermediate images
ZEISS CARL SMT GMBH0 citations52
US8355201B2Jan 15, 2013
Catadioptric projection objective
ZEISS CARL SMT GMBH0 citations52
US7982969B2Jul 19, 2011
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations52
US9164396B2Oct 20, 2015
Projection lens system of a microlithographic projection exposure installation
ZEISS CARL SMT GMBH0 citations51
US12085780B2Sep 10, 2024
Optical system, heating arrangement, and method for heating an optical element in an optical system
ZEISS CARL SMT GMBH0 citations46
US9459539B2Oct 4, 2016
Imaging optical unit for a projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
SHAFER DAVID
5 patentsUS8208199B2Jun 26, 2012
Catadioptric projection objective
SHAFER DAVID7 citations84
US8208198B2Jun 26, 2012
Catadioptric projection objective
SHAFER DAVID8 citations83
US8199400B2Jun 12, 2012
Catadioptric projection objective
SHAFER DAVID1 citations61
US8730572B2May 20, 2014
Catadioptric projection objective
SHAFER DAVID0 citations51
US8416490B2Apr 9, 2013
Catadioptric projection objective
SHAFER DAVID0 citations51