Inventor
DODOC AURELIAN
DE68 patents
⚠️ This page may combine multiple inventors who share the name “DODOC AURELIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
23 patentsUS7187503B2Mar 6, 2007
Refractive projection objective for immersion lithography
ZEISS CARL SMT AG68 citations98
US7426082B2Sep 16, 2008
Catadioptric projection objective with geometric beam splitting
ZEISS CARL SMT AG20 citations93
US7385756B2Jun 10, 2008
Catadioptric projection objective
ZEISS CARL SMT AG42 citations93
US7359036B2Apr 15, 2008
Imaging system, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT AG27 citations93
US7203010B2Apr 10, 2007
Catadioptric projection objective
ZEISS CARL SMT AG21 citations93
US6995930B2Feb 7, 2006
Catadioptric projection objective with geometric beam splitting
ZEISS CARL SMT AG39 citations93
US7532306B2May 12, 2009
Microlithographic projection exposure apparatus
ZEISS CARL SMT AG17 citations92
US7463422B2Dec 9, 2008
Projection exposure apparatus
ZEISS CARL SMT AG19 citations91
US7712905B2May 11, 2010
Imaging system with mirror group
ZEISS CARL SMT AG9 citations84
US7697198B2Apr 13, 2010
Catadioptric projection objective
ZEISS CARL SMT AG10 citations84
US7239450B2Jul 3, 2007
Method of determining lens materials for a projection exposure apparatus
ZEISS CARL SMT AG16 citations84
US7136220B2Nov 14, 2006
Catadioptric reduction lens
ZEISS CARL SMT AG19 citations84
US7570343B2Aug 4, 2009
Microlithographic projection exposure apparatus
ZEISS CARL SMT AG14 citations83
US7869122B2Jan 11, 2011
Catadioptric projection objective
ZEISS CARL SMT AG5 citations74
US7277231B2Oct 2, 2007
Projection objective of a microlithographic exposure apparatus
ZEISS CARL SMT AG8 citations74
US7551361B2Jun 23, 2009
Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
ZEISS CARL SMT AG7 citations73
US7848016B2Dec 7, 2010
High-NA projection objective
ZEISS CARL SMT AG6 citations63
US7835073B2Nov 16, 2010
Projection objective for lithography
ZEISS CARL SMT AG2 citations63
US7751129B2Jul 6, 2010
Refractive projection objective for immersion lithography
ZEISS CARL SMT AG4 citations63
US7738188B2Jun 15, 2010
Projection objective and projection exposure apparatus including the same
ZEISS CARL SMT AG2 citations63
US7408716B2Aug 5, 2008
Refractive projection objective for immersion lithography
ZEISS CARL SMT AG2 citations63
US7697211B2Apr 13, 2010
Symmetrical objective having four lens groups for microlithography
ZEISS CARL SMT AG2 citations62
US7679821B2Mar 16, 2010
Catadioptric projection objective
ZEISS CARL SMT AG0 citations52
ZEISS CARL SMT GMBH
12 patentsUS7920338B2Apr 5, 2011
Reduction projection objective and projection exposure apparatus including the same
ZEISS CARL SMT GMBH8 citations84
US9772478B2Sep 26, 2017
Catadioptric projection objective with parallel, offset optical axes
ZEISS CARL SMT GMBH2 citations72
US8913316B2Dec 16, 2014
Catadioptric projection objective with intermediate images
ZEISS CARL SMT GMBH3 citations63
US8363315B2Jan 29, 2013
Catadioptric projection objective with mirror group
ZEISS CARL SMT GMBH2 citations63
US8031326B2Oct 4, 2011
Illumination system or projection lens of a microlithographic exposure system
ZEISS CARL SMT GMBH3 citations62
US9726979B2Aug 8, 2017
Catadioptric projection objective with intermediate images
ZEISS CARL SMT GMBH0 citations52
US9134618B2Sep 15, 2015
Catadioptric projection objective with intermediate images
ZEISS CARL SMT GMBH0 citations52
US8908269B2Dec 9, 2014
Immersion catadioptric projection objective having two intermediate images
ZEISS CARL SMT GMBH0 citations52
US8355201B2Jan 15, 2013
Catadioptric projection objective
ZEISS CARL SMT GMBH0 citations52
US7969663B2Jun 28, 2011
Projection objective for immersion lithography
ZEISS CARL SMT GMBH0 citations52
US7965453B2Jun 21, 2011
Projection objective and projection exposure apparatus including the same
ZEISS CARL SMT GMBH0 citations52
US7957069B2Jun 7, 2011
Projection optical system
ZEISS CARL SMT GMBH1 citations52
DODOC AURELIAN
6 patentsUS8107162B2Jan 31, 2012
Catadioptric projection objective with intermediate images
DODOC AURELIAN18 citations92
US8858099B2Oct 14, 2014
Anamorphic objective
DODOC AURELIAN4 citations68
US8773638B2Jul 8, 2014
Microlithographic projection exposure apparatus with correction optical system that heats projection objective element
DODOC AURELIAN2 citations62
US8212991B2Jul 3, 2012
Optical system of a microlithographic projection exposure apparatus
DODOC AURELIAN2 citations62
US9036772B2May 19, 2015
Mirror for the EUV wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective
DODOC AURELIAN0 citations52
US9019596B2Apr 28, 2015
Catadioptric projection objective with intermediate images
DODOC AURELIAN0 citations52
SHAFER DAVID
6 patentsUS8208199B2Jun 26, 2012
Catadioptric projection objective
SHAFER DAVID7 citations84
US8208198B2Jun 26, 2012
Catadioptric projection objective
SHAFER DAVID8 citations83
US8804234B2Aug 12, 2014
Catadioptric projection objective including an aspherized plate
SHAFER DAVID1 citations62
US8289619B2Oct 16, 2012
Catadioptric projection objective
SHAFER DAVID2 citations62
US8199400B2Jun 12, 2012
Catadioptric projection objective
SHAFER DAVID1 citations61
US8339701B2Dec 25, 2012
Catadioptric projection objective
SHAFER DAVID0 citations52
MANN HANS-JUERGEN
2 patentsLEITZ ERNST GMBH
1 patentShowing the top 50 of 68 patents by PatentIndex Score.