Inventor

EPPLE ALEXANDER

DE84 patents

⚠️ This page may combine multiple inventors who share the name “EPPLE ALEXANDER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

EPPLE ALEXANDER

ZEISS CARL SMT AG

Refractive projection objective for immersion lithography

Projection objectives including a plurality of mirrors with lenses ahead of mirror M3

Projection objective, especially for microlithography, and method for adjusting a projection objective

Projection objectives including a plurality of mirrors with lenses ahead of mirror M3

Catadioptric projection objective with geometric beam splitting

Catadioptric projection objective

Optical system for ultraviolet light

Catadioptric projection objective

Catadioptric projection objective with geometric beam splitting

Catadioptric reduction lens

Projection exposure system

Catadioptric reduction lens

Projection exposure apparatus

Chromatically corrected catadioptric objective and projection exposure apparatus including the same

Imaging system with mirror group

Catadioptric projection objective

Catadioptric reduction lens

Catadioptric reductions lens

Projection lens system of a microlithographic projection exposure installation

Objective with at least one aspheric lens

Partial objective in an illuminating systems

Catadioptric projection objective

Catadioptric projection objective

Lithography lens system and projection exposure system provided with at least one lithography lens system of this type

Projection objective, especially for microlithography, and method for adjusting a projection objective

Reticle-masking objective with aspherical lenses

Projection objective for lithography

Refractive projection objective for immersion lithography

Imaging system for a microlithographical projection light system

Refractive optical imaging system, in particular projection objective for microlithography

ZEISS CARL SMT GMBH

Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same

Projection exposure apparatus for projection lithography

Catadioptric projection objective with parallel, offset optical axes

Catadioptric projection objective with intermediate images

Catadioptric projection objective with mirror group

Projection lens, projection exposure apparatus and projection exposure method

SHAFER DAVID

Catadioptric projection objective

Catadioptric projection objective

Catadioptric projection objective including an aspherized plate

Catadioptric projection objective

Catadioptric projection objective

ZEISS CARL SEMICONDUCTOR MFG

Lithographic objective having a first lens group including only lenses having a positive refractive power

Catadioptric reduction lens

EPPLE ALEXANDER

Catadioptric projection objective with pupil mirror, projection exposure apparatus and projection exposure method

Catadioptric projection objective

DODOC AURELIAN

Catadioptric projection objective with intermediate images

FELDMANN HEIKO

Method of manufacturing a projection objective and projection objective

ZEISS CARL MICROSCOPY GMBH

Immersion objective

BEIERL HELMUT

Projection lens system of a microlithographic projection exposure installation

ZEISS CARL AG

Optical arrangement with an overview function for a catadioptric microscope objective