Inventor

ROSTALSKI HANS-JUERGEN

DE36 patents

⚠️ This page may combine multiple inventors who share the name “ROSTALSKI HANS-JUERGEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ROSTALSKI HANS-JUERGEN

ZEISS CARL SMT AG

Refractive projection objective

Refractive projection objective for immersion lithography

Refractive projection objective

Refractive projection objective for immersion lithography

Refractive projection objective for immersion lithography

Microlithographic projection exposure apparatus

Compact 1½-waist system for sub 100 nm ArF lithography

Microlithographic projection exposure apparatus

Projection objective of a microlithographic exposure apparatus

Lithography lens system and projection exposure system provided with at least one lithography lens system of this type

Projection objective for lithography

Refractive projection objective for immersion lithography

Projection objective and projection exposure apparatus including the same

Refractive projection objective for immersion lithography

Projection objective for a microlithographic projection exposure apparatus

Projection exposure apparatus, projection exposure method and projection objective

Projection optical system

ZEISS CARL SMT GMBH

Imaging optical unit and projection exposure apparatus including same

Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same

Projection optical unit for microlithography and method for producing a structured component

Imaging optical unit for imaging an object field into an image field

Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit

Imaging optical unit and projection exposure apparatus for projection lithography, having such imaging optical unit

Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same

Projection objective for immersion lithography

Projection objective and projection exposure apparatus including the same

Measuring arrangement for measuring optical properties of a reflective optical element, in particular for microlithography

Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit

Imaging optical unit for imaging an object field into an image field, and projection exposure apparatus including such an imaging optical unit

ROSTALSKI HANS-JUERGEN

Imaging microoptics for measuring the position of an aerial image

Imaging microoptics for measuring the position of an aerial image

Optical arrangement in a projection objective of a microlithographic projection exposure apparatus

ZEISS CARL SEMICONDUCTOR MFG

Diffractive optical element and also optical arrangement comprising a diffractive optical element

PAZIDIS ALEXANDRA

Projection system with compensation of intensity variations and compensation element therefor

FELDMANN HEIKO

Projection objective for lithography

MANN HANS-JUERGEN

Imaging optics and projection exposure installation for microlithography with an imaging optics