Inventor
SHIMOHAKAMADA NAOKI
JP2 patents
Patents
2 patentsUS6821683B2Nov 23, 2004
Method for correcting design pattern of semiconductor circuit, a photomask fabricated using the corrected design pattern data, a method for inspecting the photomask and a method for generating pattern data for inspection of photomask
DAINIPPON PRINTING CO LTD13 citations78
US6560767B2May 6, 2003
Process for making photomask pattern data and photomask
DAINIPPON PRINTING CO LTD5 citations56