Inventor
REDDY KANCHARLA-ARUN K
US4 patents
Patents
4 patentsUS10464187B2Nov 5, 2019
High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC1 citations60
US10316218B2Jun 11, 2019
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations49
US10221336B2Mar 5, 2019
Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations49
US11524390B2Dec 13, 2022
Methods of making chemical mechanical polishing layers having improved uniformity
ROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC0 citations47