Inventor
MA MANNY
US19 patents
Patents
19 patentsUS6069506AMay 30, 2000
Method and apparatus for improving the performance of digital delay locked loop circuits
MICRON TECHNOLOGY INC175 citations99
US6316976B1Nov 13, 2001
Method and apparatus for improving the performance of digital delay locked loop circuits
MICRON TECHNOLOGY INC69 citations96
US5885864AMar 23, 1999
Method for forming compact memory cell using vertical devices
MICRON TECHNOLOGY INC75 citations96
US6040733AMar 21, 2000
Two-stage fusible electrostatic discharge protection circuit
MICRON TECHNOLOGY INC21 citations92
US5656967AAug 12, 1997
Two-stage fusible electrostatic discharge protection circuit
MICRON TECHNOLOGY INC17 citations82
US5985766ANov 16, 1999
Semiconductor processing methods of forming a contact opening
MICRON TECHNOLOGY INC10 citations74
US5805009ASep 8, 1998
Method for operating an electrostatic discharge protection circuit
MICRON TECHNOLOGY INC7 citations74
US6653220B2Nov 25, 2003
Advance metallization process
MICRON TECHNOLOGY INC9 citations73
US6518178B1Feb 11, 2003
Method for forming a field effect transistor having increased breakdown voltage
MICRON TECHNOLOGY INC5 citations73
US5976915ANov 2, 1999
Low mutual inductance lead frame device
MICRON TECHNOLOGY INC12 citations73
US5949114ASep 7, 1999
Semiconductor device having increased breakdown voltage and method of fabricating same
MICRON TECHNOLOGY INC4 citations73
US5880520AMar 9, 1999
Low mutual inductance lead frame device
MICRON TECHNOLOGY INC11 citations73
US5841723ANov 24, 1998
Method and apparatus for programming anti-fuses using an isolated well programming circuit
MICRON TECHNOLOGY INC16 citations73
US6274482B1Aug 14, 2001
Semiconductor processing methods of forming a contact opening
MICRON TECHNOLOGY INC2 citations63
US6444577B1Sep 3, 2002
Method of fabricating a semiconductor device having increased breakdown voltage
MICRON TECHNOLOGY INC1 citations62
US6281109B1Aug 28, 2001
Advance metallization process
MICRON TECHNOLOGY INC4 citations62
US6066548AMay 23, 2000
Advance metallization process
MICRON TECHNOLOGY INC3 citations62
US6524922B1Feb 25, 2003
Semiconductor device having increased breakdown voltage and method of fabricating same
MICRON TECHNOLOGY INC0 citations52
US6444572B2Sep 3, 2002
Semiconductor processing methods of forming a contact opening
MICRON TECHNOLOGY INC0 citations52