P

Inventor

CADIEN KENNETH C

US28 patents
⚠️ This page may combine multiple inventors who share the name “CADIEN KENNETH C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

INTEL CORP

24 patents
US5783478AJul 21, 1998

Method of frabricating a MOS transistor having a composite gate electrode

INTEL CORP157 citations99
US5625217AApr 29, 1997

MOS transistor having a composite gate electrode and method of fabrication

INTEL CORP162 citations99
US6046099AApr 4, 2000

Plug or via formation using novel slurries for chemical mechanical polishing

INTEL CORP89 citations98
US5954975ASep 21, 1999

Slurries for chemical mechanical polishing tungsten films

INTEL CORP90 citations98
US5700383ADec 23, 1997

Slurries and methods for chemical mechanical polish of aluminum and titanium aluminide

INTEL CORP176 citations98
US5611943AMar 18, 1997

Method and apparatus for conditioning of chemical-mechanical polishing pads

INTEL CORP120 citations98
US5516346AMay 14, 1996

Slurries for chemical mechanical polishing

INTEL CORP106 citations98
US5340370AAug 23, 1994

Slurries for chemical mechanical polishing

INTEL CORP410 citations98
US6178585B1Jan 30, 2001

Slurries for chemical mechanical polishing

INTEL CORP25 citations95
US5836806ANov 17, 1998

Slurries for chemical mechanical polishing

INTEL CORP60 citations95
US5407526AApr 18, 1995

Chemical mechanical polishing slurry delivery and mixing system

INTEL CORP171 citations95
US6719614B2Apr 13, 2004

Method and chemistry for cleaning of oxidized copper during chemical mechanical polishing

INTEL CORP13 citations92
US6464568B2Oct 15, 2002

Method and chemistry for cleaning of oxidized copper during chemical mechanical polishing

INTEL CORP27 citations92
US6443814B1Sep 3, 2002

Method and chemistry for cleaning of oxidized copper during chemical mechanical polishing

INTEL CORP35 citations92
US6375552B1Apr 23, 2002

Slurries for chemical mechanical polishing

INTEL CORP18 citations92
US6087733AJul 11, 2000

Sacrificial erosion control features for chemical-mechanical polishing process

INTEL CORP77 citations92
US6358853B2Mar 19, 2002

Ceria based slurry for chemical-mechanical polishing

INTEL CORP19 citations88
US5604158AFeb 18, 1997

Integrated tungsten/tungsten silicide plug process

INTEL CORP37 citations87
US6740591B1May 25, 2004

Slurry and method for chemical mechanical polishing of copper

INTEL CORP17 citations83
US6752844B2Jun 22, 2004

Ceric-ion slurry for use in chemical-mechanical polishing

INTEL CORP11 citations73
US7087188B2Aug 8, 2006

Abrasives for chemical mechanical polishing

INTEL CORP2 citations62
US6881674B2Apr 19, 2005

Abrasives for chemical mechanical polishing

INTEL CORP3 citations62
US7666465B2Feb 23, 2010

Introducing nanotubes in trenches and structures formed thereby

INTEL CORP1 citations52
US7182882B2Feb 27, 2007

Method of improving chemical mechanical polish endpoint signals by use of chemical additives

INTEL CORP0 citations49

ZINITE CORP

4 patents