Inventor

RAHMAN M DALIL

US74 patents

⚠️ This page may combine multiple inventors who share the name “RAHMAN M DALIL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RAHMAN M DALIL

CLARIANT FINANCE BVI LTD

Photoresist composition for deep UV and process thereof

Light absorbing polymers

Process for producing film forming resins for photoresist compositions

Antireflective coating compositions for photoresist compositions and use thereof

Antireflective coating material for photoresists

Metal ion reduction in novolak resin solution using an anion exchange resin

Low metals perfluorooctanoic acid and top anti-reflective coatings for photoresists

Preparation of fractionated novolak resins by a novel extraction technique

Metal ion reduction in photoresist compositions by chelating ion exchange resin

Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate

Process for producing surfactant having a low metal ion level and developer produced therefrom

Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom

Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition

Isolation of novolak resin by low temperature sub surface forced steam distillation

Fractionated novolak resin copolymer and photoresist composition therefrom

Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifuge

Isolation of novolak resin without high temperature distillation and photoresist composition therefrom

Fractionated novolak resin and photoresist composition therefrom

HOECHST CELANESE CORP

Metal ion reduction in bottom anti-reflective coatings for use in semiconductor device formation

Metal ion reduction in top anti-reflective coatings for photoresists

Process for producing a developer having a low metal ion level

Method of using a Lewis base to control molecular weight of novolak resins

Metal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefrom

Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists

Metal ion reduction in top anti-reflective coatings for photoresisis

Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin

Photoresist having a low level of metal ions

Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom

Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom

Novolak resin mixtures

Metal ion reduction in novolak resin solution using an anion exchange resin

Metal ion reduction in novolak resins and photoresists

AZ ELECTRONIC MATERIALS USA

Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds

Photoactive compounds

Photoactive compounds

Photoactive compounds

Antireflective coating composition comprising fused aromatic rings

Antireflective coating composition

Photoresist compositions

Antireflective coating composition

Photoactive compounds

Photoactive compounds

Photoactive compounds

Photoresist composition for deep UV and process thereof

Photoresist composition for deep UV and process thereof

RAHMAN M DALIL

Spin-on compositions of soluble metal oxide carboxylates and methods of their use

Antireflective coating composition and process thereof

AZ ELECTRONIC MATERIALS LUXEMBOURG SARL

Antireflective coating compositions and processes thereof

YAO HUIRONG

Stable metal compounds, their compositions and methods

MERCK PATENT GMBH

Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life