Inventor
LU PING-HUNG
US34 patents
⚠️ This page may combine multiple inventors who share the name “LU PING-HUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CLARIANT FINANCE BVI LTD
15 patentsUS5981145ANov 9, 1999
Light absorbing polymers
CLARIANT FINANCE BVI LTD59 citations96
US5733714AMar 31, 1998
Antireflective coating for photoresist compositions
CLARIANT FINANCE BVI LTD78 citations95
US6576394B1Jun 10, 2003
Negative-acting chemically amplified photoresist composition
CLARIANT FINANCE BVI LTD32 citations92
US5994430ANov 30, 1999
Antireflective coating compositions for photoresist compositions and use thereof
CLARIANT FINANCE BVI LTD42 citations92
US6800415B2Oct 5, 2004
Negative-acting aqueous photoresist composition
CLARIANT FINANCE BVI LTD12 citations74
US5876897AMar 2, 1999
Positive photoresists containing novel photoactive compounds
CLARIANT FINANCE BVI LTD9 citations74
US5763135AJun 9, 1998
Light sensitive composition containing an arylhydrazo dye
CLARIANT FINANCE BVI LTD7 citations73
US5863700AJan 26, 1999
Isolation of novolak resin without high temperature distillation and photoresist composition therefrom
CLARIANT FINANCE BVI LTD2 citations63
US5853954ADec 29, 1998
Fractionated novolak resin and photoresist composition therefrom
CLARIANT FINANCE BVI LTD5 citations63
US6096477AAug 1, 2000
Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom
CLARIANT FINANCE BVI LTD2 citations60
US6045966AApr 4, 2000
Fractionated novolak resin and photoresist composition therefrom
CLARIANT FINANCE BVI LTD6 citations60
US5910559AJun 8, 1999
Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom
CLARIANT FINANCE BVI LTD5 citations60
US5719004AFeb 17, 1998
Positive photoresist composition containing a 2,4-dinitro-1-naphthol
CLARIANT FINANCE BVI LTD5 citations60
US6090533AJul 18, 2000
Isolation of novolak resin without high temperature distillation and photoresist composition therefrom
CLARIANT FINANCE BVI LTD0 citations52
US5977288ANov 2, 1999
Fractionated novolak resin and photoresist composition therefrom
CLARIANT FINANCE BVI LTD1 citations52
AZ ELECTRONIC MATERIALS USA
6 patentsUS7255970B2Aug 14, 2007
Photoresist composition for imaging thick films
AZ ELECTRONIC MATERIALS USA11 citations83
US8017296B2Sep 13, 2011
Antireflective coating composition comprising fused aromatic rings
AZ ELECTRONIC MATERIALS USA11 citations82
US8026201B2Sep 27, 2011
Stripper for coating layer
AZ ELECTRONIC MATERIALS USA3 citations62
US7524606B2Apr 28, 2009
Nanocomposite photoresist composition for imaging thick films
AZ ELECTRONIC MATERIALS USA2 citations61
US7247419B2Jul 24, 2007
Nanocomposite photosensitive composition and use thereof
AZ ELECTRONIC MATERIALS USA2 citations61
US7078157B2Jul 18, 2006
Photosensitive composition and use thereof
AZ ELECTRONIC MATERIALS USA6 citations59
HOECHST CELANESE CORP
4 patentsUS5652317AJul 29, 1997
Antireflective coatings for photoresist compositions
HOECHST CELANESE CORP28 citations92
US5652297AJul 29, 1997
Aqueous antireflective coatings for photoresist compositions
HOECHST CELANESE CORP38 citations92
US5476750ADec 19, 1995
Metal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresists
HOECHST CELANESE CORP32 citations92
US5612164AMar 18, 1997
Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone
HOECHST CELANESE CORP11 citations71