Inventor

FUARD DAVID

FR2 patents

⚠️ This page may combine multiple inventors who share the name “FUARD DAVID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FRANCE TELECOM

1 patent

US6326302B1Dec 4, 2001

Process for the anisotropic etching of an organic dielectric polymer material by a plasma gas and application in microelectronics

FRANCE TELECOM15 citations80

COMMISSARIAT ENERGIE ATOMIQUE

1 patent

US6818488B2Nov 16, 2004

Process for making a gate for a short channel CMOS transistor structure

COMMISSARIAT ENERGIE ATOMIQUE9 citations67