P

Inventor

OHMI KAZUAKI

JP37 patents
⚠️ This page may combine multiple inventors who share the name “OHMI KAZUAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CANON KK

35 patents
US6624047B1Sep 23, 2003

Substrate and method of manufacturing the same

CANON KK150 citations99
US6468923B1Oct 22, 2002

Method of producing semiconductor member

CANON KK144 citations98
US6426270B1Jul 30, 2002

Substrate processing method and method of manufacturing semiconductor substrate

CANON KK82 citations98
US6391743B1May 21, 2002

Method and apparatus for producing photoelectric conversion device

CANON KK88 citations98
US6382292B1May 7, 2002

Method and apparatus for separating composite member using fluid

CANON KK97 citations98
US6342433B1Jan 29, 2002

Composite member its separation method and preparation method of semiconductor substrate by utilization thereof

CANON KK96 citations98
US6376332B1Apr 23, 2002

Composite member and separating method therefor, bonded substrate stack and separating method therefor, transfer method for transfer layer, and SOI substrate manufacturing method

CANON KK93 citations97
US6656271B2Dec 2, 2003

Method of manufacturing semiconductor wafer method of using and utilizing the same

CANON KK74 citations96
US6605518B1Aug 12, 2003

Method of separating composite member and process for producing thin film

CANON KK63 citations96
US6140209AOct 31, 2000

Process for forming an SOI substrate

CANON KK69 citations96
US5563092AOct 8, 1996

Method of producing a substrate for an amorphous semiconductor

CANON KK86 citations96
US6746559B2Jun 8, 2004

Method and apparatus for separating composite member using fluid

CANON KK33 citations93
US6672358B2Jan 6, 2004

Sample processing system

CANON KK33 citations93
US6653205B2Nov 25, 2003

Composite member separating method, thin film manufacturing method, and composite member separating apparatus

CANON KK35 citations93
US6629539B1Oct 7, 2003

Sample processing system

CANON KK25 citations93
US6597039B2Jul 22, 2003

Composite member, its separation method, and preparation method of semiconductor substrate by utilization thereof

CANON KK35 citations93
US6527031B1Mar 4, 2003

Sample separating apparatus and method, and substrate manufacturing method

CANON KK31 citations93
US6475323B1Nov 5, 2002

Method and apparatus for separating composite member using fluid

CANON KK33 citations93
US6127692AOct 3, 2000

Photoelectric conversion apparatus

CANON KK32 citations93
US5723877AMar 3, 1998

Photoelectric conversion apparatus

CANON KK31 citations93
US5500102AMar 19, 1996

Method of forming deposited semiconductor film

CANON KK32 citations93
US5154949AOct 13, 1992

Process for forming metal deposited film containing aluminum as main component by use of alkyl aluminum hydride

CANON KK27 citations93
US6979629B2Dec 27, 2005

Method and apparatus for processing composite member

CANON KK18 citations92
US6900114B2May 31, 2005

Separating apparatus, separating method, and method of manufacturing semiconductor substrate

CANON KK20 citations92
US6653206B2Nov 25, 2003

Method and apparatus for processing composite member

CANON KK21 citations92
US5776255AJul 7, 1998

Chemical vapor deposition apparatus

CANON KK43 citations92
US4931692AJun 5, 1990

Luminescing member, process for preparation thereof, and electroluminescent device employing same

CANON KK38 citations92
US6971432B2Dec 6, 2005

Sample processing system

CANON KK5 citations74
US6025243AFeb 15, 2000

Method for preparing a semiconductor device

CANON KK11 citations74
US5723034AMar 3, 1998

Process for forming hydrogenated amorphous silicon film

CANON KK10 citations74
US5134092AJul 28, 1992

Process for forming deposited film and process for producing semiconductor device

CANON KK8 citations74
US6609446B1Aug 26, 2003

Separating apparatus, separating method, and method of manufacturing semiconductor substrate

CANON KK9 citations73
US5182253AJan 26, 1993

Purification apparatus for superconductor fine particles

CANON KK12 citations72
US7077901B2Jul 18, 2006

Process for producing single crystal silicon wafers

CANON KK4 citations63
US8035668B2Oct 11, 2011

Exposure apparatus and device manufacturing method

CANON KK1 citations51

CANON KABUHSIKI KAISHA

1 patent

FUJI XEROX CO LTD

1 patent