P

Inventor

BRUCHHAUS RAINER

JP35 patents
⚠️ This page may combine multiple inventors who share the name “BRUCHHAUS RAINER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

INFINEON TECHNOLOGIES AG

25 patents
US6300652B1Oct 9, 2001

Memory cell configuration and method for its production

INFINEON TECHNOLOGIES AG27 citations92
US6800890B1Oct 5, 2004

Memory architecture with series grouped by cells

INFINEON TECHNOLOGIES AG14 citations83
US6746877B1Jun 8, 2004

Encapsulation of ferroelectric capacitors

INFINEON TECHNOLOGIES AG14 citations83
US6573542B2Jun 3, 2003

Capacitor electrodes arrangement with oxygen iridium between silicon and oxygen barrier layer

INFINEON TECHNOLOGIES AG18 citations83
US7041551B2May 9, 2006

Device and a method for forming a capacitor device

INFINEON TECHNOLOGIES AG9 citations73
US6858492B2Feb 22, 2005

Method for fabricating a semiconductor memory device

INFINEON TECHNOLOGIES AG8 citations73
US6773986B2Aug 10, 2004

Method for fabricating a semiconductor memory device

INFINEON TECHNOLOGIES AG10 citations73
US6815234B2Nov 9, 2004

Reducing stress in integrated circuits

INFINEON TECHNOLOGIES AG8 citations70
US7361549B2Apr 22, 2008

Method for fabricating memory cells for a memory device

INFINEON TECHNOLOGIES AG3 citations63
US7348619B2Mar 25, 2008

Ferroelectric memory arrangement

INFINEON TECHNOLOGIES AG4 citations63
US6316802B1Nov 13, 2001

Easy to manufacture integrated semiconductor memory configuration with platinum electrodes

INFINEON TECHNOLOGIES AG5 citations63
US7199002B2Apr 3, 2007

Process for fabrication of a ferroelectric capacitor

INFINEON TECHNOLOGIES AG5 citations62
US6940111B2Sep 6, 2005

Radiation protection in integrated circuits

INFINEON TECHNOLOGIES AG5 citations62
US6839220B1Jan 4, 2005

Multi-layer barrier allowing recovery anneal for ferroelectric capacitors

INFINEON TECHNOLOGIES AG2 citations62
US6346424B1Feb 12, 2002

Process for producing high-epsilon dielectric layer or ferroelectric layer

INFINEON TECHNOLOGIES AG6 citations62
US7522444B2Apr 21, 2009

Memory circuit, method for operating a memory circuit, memory device and method for producing a memory device

INFINEON TECHNOLOGIES AG0 citations52
US7378700B2May 27, 2008

Self-aligned V0-contact for cell size reduction

INFINEON TECHNOLOGIES AG1 citations51
US7316980B2Jan 8, 2008

Method for forming ferrocapacitors and FeRAM devices

INFINEON TECHNOLOGIES AG1 citations51
US7198959B2Apr 3, 2007

Process for fabrication of a ferrocapacitor

INFINEON TECHNOLOGIES AG1 citations51
US7098142B2Aug 29, 2006

Method of etching ferroelectric devices

INFINEON TECHNOLOGIES AG1 citations51
US7061035B2Jun 13, 2006

Self-aligned V0-contact for cell size reduction

INFINEON TECHNOLOGIES AG1 citations51
US6867053B2Mar 15, 2005

Fabrication of a FeRAM capacitor using a noble metal hardmask

INFINEON TECHNOLOGIES AG0 citations51
US6704219B2Mar 9, 2004

FeRAM memory and method for manufacturing it

INFINEON TECHNOLOGIES AG1 citations51
US7183121B2Feb 27, 2007

Process for fabrication of a ferrocapacitor

INFINEON TECHNOLOGIES AG0 citations41
US6818503B2Nov 16, 2004

Method for fabricating a semiconductor memory device

INFINEON TECHNOLOGIES AG0 citations41

SIEMENS AG

6 patents

ANDRES DIETER

1 patent

INFINEON AG

1 patent

TOSHIBA KK

1 patent

ROSEZIN ROLAND DANIEL

1 patent