Inventor
AMEMIYA ISAO
JP30 patents
⚠️ This page may combine multiple inventors who share the name “AMEMIYA ISAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
17 patentsUS7002723B2Feb 21, 2006
Display device
TOSHIBA KK22 citations92
US5580441ADec 3, 1996
Method of measuring ion concentration and apparatus therefor
TOSHIBA KK37 citations92
US6045208AApr 4, 2000
Ink-jet recording device having an ultrasonic generating element array
TOSHIBA KK43 citations90
US7207651B2Apr 24, 2007
Inkjet printing apparatus
TOSHIBA KK12 citations84
US6036301AMar 14, 2000
Ink jet recording apparatus
TOSHIBA KK17 citations84
US7790485B2Sep 7, 2010
Semiconductor light emitting device and method of manufacturing the same
TOSHIBA KK9 citations82
US5011589AApr 30, 1991
Solution component sensor device
TOSHIBA KK19 citations81
US6123412ASep 26, 2000
Supersonic wave, ink jet recording apparatus including ink circulation means
TOSHIBA KK13 citations71
US7997694B2Aug 16, 2011
Inkjet recording apparatus
TOSHIBA KK2 citations63
US7839087B2Nov 23, 2010
Light emitting device and method of manufacturing the same
TOSHIBA KK4 citations63
US7692261B2Apr 6, 2010
Optical sensor element and method for driving the same
TOSHIBA KK5 citations63
US7121454B2Oct 17, 2006
Moving-film display device
TOSHIBA KK3 citations63
US6116721ASep 12, 2000
Ink jet recording device
TOSHIBA KK6 citations63
US8373359B2Feb 12, 2013
Light-emitting device and driving method thereof
TOSHIBA KK2 citations62
US7981526B2Jul 19, 2011
Display device
TOSHIBA KK2 citations62
US6930660B2Aug 16, 2005
Display device
TOSHIBA KK2 citations57
USRE45683ESep 29, 2015
Printing device
TOSHIBA KK0 citations51
HOYA CORP
7 patentsUS6812473B1Nov 2, 2004
Electron beam drawing mask blank, electron beam drawing mask, and method of manufacturing the same
HOYA CORP81 citations98
US5756237AMay 26, 1998
Production of projection mask
HOYA CORP43 citations92
US6855467B2Feb 15, 2005
Transfer mask, method of dividing pattern or transfer mask, and method of manufacturing transfer mask
HOYA CORP8 citations74
US6387574B1May 14, 2002
Substrate for transfer mask and method for manufacturing transfer mask by use of substrate
HOYA CORP8 citations74
US6162566ADec 19, 2000
Mask holder for supporting transfer mask
HOYA CORP15 citations74
US7445875B2Nov 4, 2008
Mask blank and mask for electron beam exposure
HOYA CORP0 citations52
US7465523B2Dec 16, 2008
Method for manufacturing transfer mask substrate, transfer mask substrate, and transfer mask
HOYA CORP0 citations42