Inventor

HAMAMOTO KAZUHIRO

US40 patents

⚠️ This page may combine multiple inventors who share the name “HAMAMOTO KAZUHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HAMAMOTO KAZUHIRO

HOYA CORP

Reflective mask blank, reflective mask and method of manufacturing semiconductor device

Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method

Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device

Conductive film coated substrate, multilayer reflective film coated substrate, reflective mask blank, reflective mask, and semiconductor device manufacturing method

Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing method

Substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method

Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method

Reflective mask blank, method of manufacturing same, reflective mask and method of manufacturing semiconductor device

Reflective mask blank, method of manufacturing reflective mask blank, reflective mask and method of manufacturing semiconductor device

Reflective structure, reflective mask blank, reflective mask and method of manufacturing semiconductor device

Reflective film coated substrate, mask blank, reflective mask, and semiconductor device manufacturing method

Substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device

Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device

Method for manufacturing reflective mask blank, and method for manufacturing reflective mask

Substrate with an electrically conductive film, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device

Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device

Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method

Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method

Reflective mask blank, reflective mask and method of manufacturing semiconductor device

Multilayer reflective film formed substrate, reflective mask blank, mask blank, methods of manufacturing the same, reflective mask, and mask

Method for manufacturing reflective mask blank, and method for manufacturing reflective mask

Multilayer reflective film formed substrate, reflective mask blank, mask blank, methods of manufacturing the same, reflective mask, and mask

Method for producing substrate with multilayer reflective film, method for producing reflective mask blank and method for producing reflective mask

Method for producing substrate with multilayer reflective film, method for producing reflective mask blank and method for producing reflective mask

Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method

Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask blank, transmissive mask, reflective mask, and semiconductor device fabrication method

Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method

Reflective mask blank, method of manufacturing reflective mask blank, reflective mask and method of manufacturing semiconductor device

Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor device

Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device

Substrate with multilayer reflective film, mask blank, transfer mask and method of manufacturing semiconductor device

Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, method of manufacturing mask blank substrate, method of manufacturing substrate with reflective film and method of manufacturing semiconductor device

Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device

Conductive film coated substrate, multilayer reflective film coated substrate, reflective mask blank, reflective mask, and semiconductor device manufacturing method

Conductive film coated substrate, multilayer reflective film coated substrate, reflective mask blank, reflective mask, and semiconductor device manufacturing method

Method of manufacturing substrate with a multilayer reflective film, method of manufacturing a reflective mask blank, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing a semiconductor device

TEXAS INSTRUMENTS INC

Method of making a semiconductor device having a flat surface

Semiconductor device manufacturing method

Method for filling a via opening or contact opening in an integrated circuit

TOKYO ELECTRON LTD

Method for treating a dielectric film