Inventor
LIN JUEI-WEN
TW2 patents
Patents
2 patentsUS6489227B1Dec 3, 2002
Method of etching a polysilicon layer during the stripping of the photoresist shape used as an etch mask to create an opening to an underlying fuse structure
TAIWAN SEMICONDUCTOR MFG17 citations80
US6723654B2Apr 20, 2004
Method and apparatus for in-situ descum/hot bake/dry etch photoresist/polyimide layer
TAIWAN SEMICONDUCTOR MFG4 citations55