Inventor
HANSEN STEVEN GEORGE
US29 patents
⚠️ This page may combine multiple inventors who share the name “HANSEN STEVEN GEORGE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
23 patentsUS7245356B2Jul 17, 2007
Lithographic apparatus and method for optimizing illumination using a photolithographic simulation
ASML NETHERLANDS BV72 citations98
US7030966B2Apr 18, 2006
Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations
ASML NETHERLANDS BV100 citations98
US7180576B2Feb 20, 2007
Exposure with intensity balancing to mimic complex illuminator shape
ASML NETHERLANDS BV29 citations92
US7016017B2Mar 21, 2006
Lithographic apparatus and method for optimizing an illumination source using isofocal compensation
ASML NETHERLANDS BV41 citations92
US6839125B2Jan 4, 2005
Method for optimizing an illumination source using full resist simulation and process window response metric
ASML NETHERLANDS BV43 citations92
US11126090B2Sep 21, 2021
Model for calculating a stochastic variation in an arbitrary pattern
ASML NETHERLANDS BV9 citations86
US10545411B2Jan 28, 2020
Model for calculating a stochastic variation in an arbitrary pattern
ASML NETHERLANDS BV8 citations84
US9934346B2Apr 3, 2018
Source mask optimization to reduce stochastic effects
ASML NETHERLANDS BV14 citations84
US7256873B2Aug 14, 2007
Enhanced lithographic resolution through double exposure
ASML NETHERLANDS BV12 citations83
US7684013B2Mar 23, 2010
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV12 citations82
US7781149B2Aug 24, 2010
Reduced pitch multiple exposure process
ASML NETHERLANDS BV16 citations79
US11354484B2Jun 7, 2022
Failure model for predicting failure due to resist layer
ASML NETHERLANDS BV2 citations73
US10795267B2Oct 6, 2020
Model for estimating stochastic variation
ASML NETHERLANDS BV3 citations73
US8043797B2Oct 25, 2011
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV4 citations63
US7528934B2May 5, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV3 citations63
US12554203B2Feb 17, 2026
Model for calculating a stochastic variation in an arbitrary pattern
ASML NETHERLANDS BV0 citations62
US11835862B2Dec 5, 2023
Model for calculating a stochastic variation in an arbitrary pattern
ASML NETHERLANDS BV0 citations62
US7906270B2Mar 15, 2011
Reduced pitch multiple exposure process
ASML NETHERLANDS BV6 citations59
US7471375B2Dec 30, 2008
Correction of optical proximity effects by intensity modulation of an illumination arrangement
ASML NETHERLANDS BV5 citations57
US9651875B2May 16, 2017
Illumination system and lithographic apparatus
ASML NETHERLANDS BV0 citations52
US7898644B2Mar 1, 2011
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV1 citations52
US11029594B2Jun 8, 2021
Optimization of a lithography apparatus or patterning process based on selected aberration
ASML NETHERLANDS BV0 citations44
US7981595B2Jul 19, 2011
Reduced pitch multiple exposure process
ASML NETHERLANDS BV0 citations38
HANSEN STEVEN GEORGE
5 patentsUS8786824B2Jul 22, 2014
Source-mask optimization in lithographic apparatus
HANSEN STEVEN GEORGE38 citations93
US9213783B2Dec 15, 2015
Source mask optimization to reduce stochastic effects
HANSEN STEVEN GEORGE22 citations92
US8982324B2Mar 17, 2015
Polarization designs for lithographic apparatus
HANSEN STEVEN GEORGE1 citations51
US8576377B2Nov 5, 2013
Lithographic apparatus and device manufacturing method
HANSEN STEVEN GEORGE1 citations49
US9563135B2Feb 7, 2017
Process tuning with polarization
HANSEN STEVEN GEORGE0 citations38