Inventor
GRUMBINE STEVEN
US36 patents
⚠️ This page may combine multiple inventors who share the name “GRUMBINE STEVEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CABOT MICROELECTRONICS CORP
25 patentsUS9127187B1Sep 8, 2015
Mixed abrasive tungsten CMP composition
CABOT MICROELECTRONICS CORP24 citations92
US7994057B2Aug 9, 2011
Polishing composition and method utilizing abrasive particles treated with an aminosilane
CABOT MICROELECTRONICS CORP30 citations92
US9309442B2Apr 12, 2016
Composition for tungsten buffing
CABOT MICROELECTRONICS CORP6 citations84
US9303188B2Apr 5, 2016
Composition for tungsten CMP
CABOT MICROELECTRONICS CORP14 citations84
US9238754B2Jan 19, 2016
Composition for tungsten CMP
CABOT MICROELECTRONICS CORP9 citations84
US9567491B2Feb 14, 2017
Tungsten chemical-mechanical polishing composition
CABOT MICROELECTRONICS CORP7 citations83
US9556363B2Jan 31, 2017
Copper barrier chemical-mechanical polishing composition
CABOT MICROELECTRONICS CORP8 citations82
US9499721B2Nov 22, 2016
Colloidal silica chemical-mechanical polishing composition
CABOT MICROELECTRONICS CORP8 citations82
US9422457B2Aug 23, 2016
Colloidal silica chemical-mechanical polishing concentrate
CABOT MICROELECTRONICS CORP7 citations82
US9422456B2Aug 23, 2016
Colloidal silica chemical-mechanical polishing composition
CABOT MICROELECTRONICS CORP9 citations82
US9803106B2Oct 31, 2017
Methods for fabricating a chemical-mechanical polishing composition
CABOT MICROELECTRONICS CORP4 citations80
US11034862B2Jun 15, 2021
Polishing composition and method utilizing abrasive particles treated with an aminosilane
CABOT MICROELECTRONICS CORP1 citations73
US9303189B2Apr 5, 2016
Composition for tungsten CMP
CABOT MICROELECTRONICS CORP4 citations73
US8961807B2Feb 24, 2015
CMP compositions with low solids content and methods related thereto
CABOT MICROELECTRONICS CORP5 citations73
US9303190B2Apr 5, 2016
Mixed abrasive tungsten CMP composition
CABOT MICROELECTRONICS CORP5 citations72
US10647887B2May 12, 2020
Tungsten buff polishing compositions with improved topography
CABOT MICROELECTRONICS CORP2 citations70
US9617450B2Apr 11, 2017
Polishing composition and method utilizing abrasive particles treated with an aminosilane
CABOT MICROELECTRONICS CORP1 citations62
US7776230B2Aug 17, 2010
CMP system utilizing halogen adduct
CABOT MICROELECTRONICS CORP3 citations62
US10988635B2Apr 27, 2021
Composition and method for copper barrier CMP
CABOT MICROELECTRONICS CORP1 citations59
US10508219B2Dec 17, 2019
Polishing composition and method utilizing abrasive particles treated with an aminosilane
CABOT MICROELECTRONICS CORP0 citations52
US9566686B2Feb 14, 2017
Composition for tungsten CMP
CABOT MICROELECTRONICS CORP1 citations52
US10358579B2Jul 23, 2019
CMP compositions and methods for polishing nickel phosphorous surfaces
CABOT MICROELECTRONICS CORP0 citations51
US7803203B2Sep 28, 2010
Compositions and methods for CMP of semiconductor materials
CABOT MICROELECTRONICS CORP1 citations51
US10968366B2Apr 6, 2021
Composition and method for metal CMP
CABOT MICROELECTRONICS CORP0 citations47
US8920667B2Dec 30, 2014
Chemical-mechanical polishing composition containing zirconia and metal oxidizer
CABOT MICROELECTRONICS CORP0 citations42
GRUMBINE STEVEN
5 patentsUS9028572B2May 12, 2015
Polishing composition and method utilizing abrasive particles treated with an aminosilane
GRUMBINE STEVEN14 citations91
US8960177B2Feb 24, 2015
Wiresaw cutting method
GRUMBINE STEVEN6 citations79
US8157876B2Apr 17, 2012
Slurry composition containing non-ionic polymer and method for use
GRUMBINE STEVEN3 citations60
US8851059B2Oct 7, 2014
Self-cleaning wiresaw apparatus and method
GRUMBINE STEVEN2 citations56
US8636560B2Jan 28, 2014
Wiresaw apparatus and method for continuous removal of magnetic impurties during wiresaw cutting
GRUMBINE STEVEN0 citations50