Inventor
HAYASHIDA AKIRA
JP51 patents
⚠️ This page may combine multiple inventors who share the name “HAYASHIDA AKIRA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
39 patentsUS4849196AJul 18, 1989
Process for producing silicon carbide whiskers
SHINETSU CHEMICAL CO57 citations94
US5599892AFeb 4, 1997
Preparation of polysilanes
SHINETSU CHEMICAL CO21 citations93
US4948763AAug 14, 1990
Preparation of hollow ceramic fibers
SHINETSU CHEMICAL CO23 citations93
US4869854ASep 26, 1989
Process for manufacturing organic silazane polymers and ceramics therefrom
SHINETSU CHEMICAL CO29 citations93
US4981666AJan 1, 1991
Method for the preparation of silicon carbide whiskers
SHINETSU CHEMICAL CO33 citations92
US4657991AApr 14, 1987
Precursor composition of silicon carbide
SHINETSU CHEMICAL CO25 citations92
US4604367AAug 5, 1986
Method for the preparation of an inorganic fiber containing silicon, carbon, boron and nitrogen
SHINETSU CHEMICAL CO37 citations92
US4571331AFeb 18, 1986
Ultrafine powder of silicon carbide, a method for the preparation thereof and a sintered body therefrom
SHINETSU CHEMICAL CO38 citations89
US6143409ANov 7, 2000
Polycarbodiimide resin-containing adhesive and flexible printed circuit board
SHINETSU CHEMICAL CO17 citations83
US4550151AOct 29, 1985
Organoborosilicon polymer and a method for the preparation thereof
SHINETSU CHEMICAL CO23 citations82
US4847345AJul 11, 1989
Process for manufacturing organic silazane polymers and ceramics therefrom
SHINETSU CHEMICAL CO22 citations81
US4771118ASep 13, 1988
Process for manufacturing organic silazane polymers and process for manufacturing ceramics from the polymers
SHINETSU CHEMICAL CO20 citations81
US4958040ASep 18, 1990
Process for the preparation of diorganohalogenosilanes
SHINETSU CHEMICAL CO11 citations74
US5916675AJun 29, 1999
Polycarbodiimide resin-containing adhesive and flexible printed circuit board
SHINETSU CHEMICAL CO15 citations73
US5821325AOct 13, 1998
Polycarbodiimide derivatives and method for preparing the same
SHINETSU CHEMICAL CO7 citations73
US5750636AMay 12, 1998
Process for the preparation of a high-molecular-weight polycarbodiimide solution
SHINETSU CHEMICAL CO8 citations73
US4762810AAug 9, 1988
Method for the preparation of a sintered body of silicon carbide
SHINETSU CHEMICAL CO16 citations73
US4870035ASep 26, 1989
Process for manufacturing organic silazane polymers and process for manufacturing ceramics from the polymers
SHINETSU CHEMICAL CO7 citations72
US5011639AApr 30, 1991
Method for the preparation of a sintered body of silicon carbide
SHINETSU CHEMICAL CO12 citations71
US4975392ADec 4, 1990
Method for manufacturing silicon carbide whisker
SHINETSU CHEMICAL CO13 citations71
US5804257ASep 8, 1998
Polysilane compositions
SHINETSU CHEMICAL CO6 citations63
US5580912ADec 3, 1996
Polysilane compositions
SHINETSU CHEMICAL CO2 citations63
US5296418AMar 22, 1994
Method for manufacturing a hafnium-containing silazane polymer and a method for manufacturing a ceramic from said polymer
SHINETSU CHEMICAL CO4 citations63
US5237033AAug 17, 1993
Preparation of polysilanes
SHINETSU CHEMICAL CO6 citations63
US5210058AMay 11, 1993
Method for preparing organic silazane polymers and method for preparing ceramics from the polymers
SHINETSU CHEMICAL CO3 citations63
US5200371AApr 6, 1993
Method for preparing organic silazane polymers and method for preparing ceramics from the polymers
SHINETSU CHEMICAL CO3 citations63
US5162477ANov 10, 1992
Preparation of polyorganosilanes
SHINETSU CHEMICAL CO5 citations63
US5128430AJul 7, 1992
Preparation of polysilanes
SHINETSU CHEMICAL CO3 citations63
US5075474ADec 24, 1991
Method for preparing hexamethyl cyclotrisilazane
SHINETSU CHEMICAL CO5 citations63
US5041515AAug 20, 1991
Methods for preparing polytitanocarbosilazane polymers and ceramics therefrom
SHINETSU CHEMICAL CO6 citations63
US4246178AJan 20, 1981
Tetrahydropyran-5-one compounds
SHINETSU CHEMICAL CO2 citations63
US5837801ANov 17, 1998
Method for preparing crosslinked polycarbodiimides
SHINETSU CHEMICAL CO4 citations62
US5770661AJun 23, 1998
Polycarbodiimide derivative and process for producing the same
SHINETSU CHEMICAL CO3 citations62
US5750637AMay 12, 1998
Process for the preparation of a polycarbodiimide solution
SHINETSU CHEMICAL CO4 citations62
US5145813ASep 8, 1992
Process for manufacturing organic silazane polymers and ceramics therefrom
SHINETSU CHEMICAL CO2 citations59
US5183875AFeb 2, 1993
Method for manufacturing a hafnium-containing silazane polymer and a method for manufacturing a ceramic from said polymer
SHINETSU CHEMICAL CO0 citations52
US5157096AOct 20, 1992
Method and apparatus for preparing organic silazane polymer and method for preparing inorganic fibers
SHINETSU CHEMICAL CO0 citations52
US5008348AApr 16, 1991
Infusibilization of organic silazane polymers
SHINETSU CHEMICAL CO1 citations52
US5097055AMar 17, 1992
Production of methylphenyltrisiloxane
SHINETSU CHEMICAL CO0 citations49
UENO MASAAKI
3 patentsUS8501599B2Aug 6, 2013
Substrate processing apparatus and substrate processing method
UENO MASAAKI470 citations97
US8148271B2Apr 3, 2012
Substrate processing apparatus, coolant gas supply nozzle and semiconductor device manufacturing method
UENO MASAAKI22 citations91
US8507296B2Aug 13, 2013
Substrate processing method and film forming method
UENO MASAAKI4 citations60
HITACHI INT ELECTRIC INC
3 patentsUS7727780B2Jun 1, 2010
Substrate processing method and semiconductor manufacturing apparatus
HITACHI INT ELECTRIC INC6 citations63
US7700054B2Apr 20, 2010
Substrate processing apparatus having gas side flow via gas inlet
HITACHI INT ELECTRIC INC5 citations62
US7863204B2Jan 4, 2011
Substrate processing apparatus, heating apparatus for use in the same, method of manufacturing semiconductors with those apparatuses, and heating element supporting structure
HITACHI INT ELECTRIC INC3 citations61
HAYASHIDA AKIRA
3 patentsUS8158911B2Apr 17, 2012
Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and extending member
HAYASHIDA AKIRA3 citations59
US8116618B2Feb 14, 2012
Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices
HAYASHIDA AKIRA2 citations59
US9184069B2Nov 10, 2015
Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and insulator
HAYASHIDA AKIRA1 citations48
FUJITSU LTD
1 patentYAMAZAKI KEISHIN
1 patentShowing the top 50 of 51 patents by PatentIndex Score.