Inventor
CHANDRA HARIPIN
US28 patents
⚠️ This page may combine multiple inventors who share the name “CHANDRA HARIPIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VERSUM MAT US LLC
14 patentsUS10453675B2Oct 22, 2019
Organoaminosilane precursors and methods for depositing films comprising same
VERSUM MAT US LLC17 citations94
US10145008B2Dec 4, 2018
Compositions and methods using same for carbon doped silicon containing films
VERSUM MAT US LLC8 citations84
US11152206B2Oct 19, 2021
Compositions and methods using same for carbon doped silicon containing films
VERSUM MAT US LLC4 citations73
US11139162B2Oct 5, 2021
Organoaminosilane precursors and methods for depositing films comprising same
VERSUM MAT US LLC2 citations73
US10985010B2Apr 20, 2021
Methods for making silicon and nitrogen containing films
VERSUM MAT US LLC4 citations73
US10283348B2May 7, 2019
High temperature atomic layer deposition of silicon-containing films
VERSUM MAT US LLC2 citations73
US11742200B2Aug 29, 2023
Composition and methods using same for carbon doped silicon containing films
VERSUM MAT US LLC0 citations62
US11725111B2Aug 15, 2023
Compositions and processes for depositing carbon-doped silicon-containing films
VERSUM MAT US LLC0 citations62
US10991571B2Apr 27, 2021
High temperature atomic layer deposition of silicon oxide thin films
VERSUM MAT US LLC1 citations62
US11649547B2May 16, 2023
Deposition of carbon doped silicon oxide
VERSUM MAT US LLC0 citations52
US10460929B2Oct 29, 2019
Organoaminosilane precursors and methods for depositing films comprising same
VERSUM MAT US LLC0 citations52
US10283350B2May 7, 2019
Methods for depositing films with organoaminodisilane precursors
VERSUM MAT US LLC0 citations52
US10077364B2Sep 18, 2018
Organoaminodisilane precursors and methods for depositing films comprising same
VERSUM MAT US LLC0 citations52
US9997350B2Jun 12, 2018
Methods for depositing films with organoaminodisilane precursors
VERSUM MAT US LLC0 citations52
AIR PROD & CHEM
10 patentsUS8993072B2Mar 31, 2015
Halogenated organoaminosilane precursors and methods for depositing films comprising same
AIR PROD & CHEM285 citations98
US9337018B2May 10, 2016
Methods for depositing films with organoaminodisilane precursors
AIR PROD & CHEM15 citations92
US9460912B2Oct 4, 2016
High temperature atomic layer deposition of silicon oxide thin films
AIR PROD & CHEM9 citations84
US9200167B2Dec 1, 2015
Alkoxyaminosilane compounds and applications thereof
AIR PROD & CHEM10 citations84
US9905415B2Feb 27, 2018
Methods for depositing silicon nitride films
AIR PROD & CHEM10 citations81
US10242864B2Mar 26, 2019
High temperature atomic layer deposition of silicon oxide thin films
AIR PROD & CHEM4 citations73
US9613799B2Apr 4, 2017
Methods for depositing films with organoaminodisilane precursors
AIR PROD & CHEM1 citations63
US9978585B2May 22, 2018
Organoaminodisilane precursors and methods for depositing films comprising same
AIR PROD & CHEM1 citations52
US9627193B2Apr 18, 2017
Organoaminodisilane precursors and methods for depositing films comprising same
AIR PROD & CHEM0 citations52
US10319584B2Jun 11, 2019
Compositions and processes for depositing carbon-doped silicon-containing films
AIR PROD & CHEM0 citations49
XIAO MANCHAO
3 patentsUS8771807B2Jul 8, 2014
Organoaminosilane precursors and methods for making and using same
XIAO MANCHAO453 citations98
US9005719B2Apr 14, 2015
Organoaminosilane precursors and methods for making and using same
XIAO MANCHAO12 citations83
US9447287B2Sep 20, 2016
Compositions and processes for depositing carbon-doped silicon-containing films
XIAO MANCHAO1 citations52