Inventor

MENG SHUANG

US44 patents

⚠️ This page may combine multiple inventors who share the name “MENG SHUANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MENG SHUANG

MICRON TECHNOLOGY INC

Atomic layer deposition method of depositing an oxide on a substrate

Atomic layer deposition method of depositing an oxide on a substrate

Enhanced atomic layer deposition

Multiple deposition for integration of spacers in pitch multiplication process

Pitch reduced patterns relative to photolithography features

Insitu post atomic layer deposition destruction of active species

Pitch reduced patterns relative to photolithography features

Enhanced atomic layer deposition

Methods of fabricating interconnects for semiconductor components

Methods of fabricating interconnects for semiconductor components including a through hole entirely through the component and forming a metal nitride including separate precursor cycles

Methods of fabricating interconnects for semiconductor components including plating solder-wetting material and solder filling

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

High dielectric constant transition metal oxide materials

High dielectric constant transition metal oxide materials

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Methods of fabricating interconnects including depositing a first material in the interconnect with a thickness of angstroms and a low temperature for semiconductor components

Atomic layer deposition method of forming an oxide comprising layer on a substrate

Atomic layer deposition method of forming an oxide comprising layer on a substrate

Atomic layer deposition method of forming an oxide comprising layer on a substrate

Systems and methods for depositing material onto microfeature workpieces in reaction chambers

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

ROUND ROCK RES LLC

Pitch reduced patterns relative to photolithography features

Multiple deposition for integration of spacers in pitch multiplication process

Pitch reduced patterns relative to photolithography features

Enhanced atomic layer deposition

Transistor with reduced depletion field width

TRAN LUAN

Integrated circuit having pitch reduced patterns relative to photoithography features

Pitch reduced patterns relative to photolithography features

Pitch reduced patterns relative to photolithography features

ENTEGRIS INC

Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor

CVD Mo deposition by using MoOCl4

Low temperature molybdenum film deposition utilizing boron nucleation layers

MATTSON TECH INC

Processing of semiconductors using vaporized solvents

Air leak detection in plasma processing apparatus with separation grid

LODESTAR LICENSING GROUP LLC

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

ZHOU BAOSUO

Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same

SMYTHE JOHN A

Method to deposit conformal low temperature SiO2

BAI JINGYI

Multiple deposition for integration of spacers in pitch multiplication process

SARIGIANNIS DEMETRIUS

Insitu post atomic layer deposition destruction of active species

LI JIUTAO

High dielectric constant transition metal oxide materials

ROUND ROCK RESARCH LLC

Transistor with reduced depletion field width