Inventor
COPPA BRIAN J
US14 patents
⚠️ This page may combine multiple inventors who share the name “COPPA BRIAN J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MICRON TECHNOLOGY INC
5 patentsUS10607844B2Mar 31, 2020
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
MICRON TECHNOLOGY INC4 citations84
US10096483B2Oct 9, 2018
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
MICRON TECHNOLOGY INC6 citations84
US9761457B2Sep 12, 2017
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
MICRON TECHNOLOGY INC7 citations84
US9305782B2Apr 5, 2016
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
MICRON TECHNOLOGY INC3 citations82
US11335563B2May 17, 2022
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
MICRON TECHNOLOGY INC0 citations62
TOKYO ELECTRON LTD
4 patentsUS10446453B2Oct 15, 2019
Surface modification control for etch metric enhancement
TOKYO ELECTRON LTD43 citations91
US10304668B2May 28, 2019
Localized process control using a plasma system
TOKYO ELECTRON LTD46 citations90
US10773282B2Sep 15, 2020
Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
TOKYO ELECTRON LTD45 citations89
US11273469B2Mar 15, 2022
Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
TOKYO ELECTRON LTD0 citations57
LODESTAR LICENSING GROUP LLC
2 patentsUS12463044B2Nov 4, 2025
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
LODESTAR LICENSING GROUP LLC0 citations62
US11935756B2Mar 19, 2024
Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
LODESTAR LICENSING GROUP LLC0 citations62