Inventor
YOSHIKAWA RYOICHI
JP43 patents
⚠️ This page may combine multiple inventors who share the name “YOSHIKAWA RYOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NUFLARE TECHNOLOGY INC
16 patentsUS9343268B2May 17, 2016
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC3 citations73
US9287090B2Mar 15, 2016
Multi charged particle beam writing apparatus, and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC6 citations73
US9202673B2Dec 1, 2015
Multi charged particle beam writing method and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC4 citations73
US8729507B2May 20, 2014
Multi charged particle beam writing method and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC5 citations73
USRE47561EAug 6, 2019
Multi charged particle beam writing method and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC1 citations63
US9076564B2Jul 7, 2015
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC2 citations63
US8907306B2Dec 9, 2014
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC3 citations63
US8741547B2Jun 3, 2014
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC2 citations63
US10020159B2Jul 10, 2018
Multi charged particle beam writing method and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC0 citations52
US9934935B2Apr 3, 2018
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC1 citations52
US9691585B2Jun 27, 2017
Multi charged particle beam writing method, and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC1 citations52
US9570267B2Feb 14, 2017
Multi charged particle beam writing method and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC0 citations52
US10796882B2Oct 6, 2020
Charged particle beam writing apparatus and charged particle beam writing method
NUFLARE TECHNOLOGY INC0 citations42
US10784080B2Sep 22, 2020
Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method
NUFLARE TECHNOLOGY INC0 citations42
US9805905B2Oct 31, 2017
Blanking device for multi-beam of charged particle writing apparatus using multi-beam of charged particle and defective beam blocking method for multi-beam of charged particle
NUFLARE TECHNOLOGY INC0 citations42
US9530610B2Dec 27, 2016
Blanking aperture array device for multi-beams, and fabrication method of blanking aperture array device for multi-beams
NUFLARE TECHNOLOGY INC0 citations36
CANON KK
15 patentsUS4522479AJun 11, 1985
Flash apparatus with power supply control device
CANON KK10 citations74
US4389111AJun 21, 1983
Camera
CANON KK9 citations74
US4114173ASep 12, 1978
Photographic camera with an operation mode display device
CANON KK13 citations74
US4656466AApr 7, 1987
Electro-optic display device
CANON KK16 citations73
US4067032AJan 3, 1978
Structure of camera body
CANON KK16 citations72
US4279494AJul 21, 1981
Camera body
CANON KK8 citations67
US4466719AAug 21, 1984
Wind-up device for camera
CANON KK4 citations63
US4410252AOct 18, 1983
Single lens reflex camera
CANON KK2 citations63
US4400073AAug 23, 1983
Safety device for a camera with a winding motor
CANON KK5 citations63
US4361391ANov 30, 1982
Film magazine holding device for camera
CANON KK4 citations63
US4322148AMar 30, 1982
Information indicating device for single lens reflex camera with built-in flash unit
CANON KK5 citations63
US4238151ADec 9, 1980
Pentaprism mount assembly
CANON KK3 citations63
US4542974ASep 24, 1985
Flash photography apparatus
CANON KK4 citations62
US4181417AJan 1, 1980
Shutter operation control device for a photographic camera
CANON KK3 citations58
US4306784ADec 22, 1981
Photographic camera with an operation mode display device
CANON KK0 citations52
TOSHIBA KK
4 patentsUS5185812AFeb 9, 1993
Optical pattern inspection system
TOSHIBA KK92 citations94
US5760410AJun 2, 1998
Electron beam lithography apparatus and method
TOSHIBA KK22 citations92
US5404410AApr 4, 1995
Method and system for generating a bit pattern
TOSHIBA KK38 citations92
US4623256ANov 18, 1986
Apparatus for inspecting mask used for manufacturing integrated circuits
TOSHIBA KK41 citations92
TOKYO SHIBAURA ELECTRIC CO
4 patentsUS4559603ADec 17, 1985
Apparatus for inspecting a circuit pattern drawn on a photomask used in manufacturing large scale integrated circuits
TOKYO SHIBAURA ELECTRIC CO42 citations92
US4410800AOct 18, 1983
Electron beam exposure system
TOKYO SHIBAURA ELECTRIC CO11 citations74
US4647782AMar 3, 1987
Charged particle beam exposure apparatus
TOKYO SHIBAURA ELECTRIC CO19 citations73
US4558225ADec 10, 1985
Target body position measuring method for charged particle beam fine pattern exposure system
TOKYO SHIBAURA ELECTRIC CO15 citations73