P

Inventor

TSAI SHIH-HUNG

TW90 patents
⚠️ This page may combine multiple inventors who share the name “TSAI SHIH-HUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

UNITED MICROELECTRONICS CORP

40 patents
US9530778B1Dec 27, 2016

Semiconductor devices having metal gate and method for manufacturing semiconductor devices having metal gate

UNITED MICROELECTRONICS CORP40 citations94
US9349833B1May 24, 2016

Semiconductor device and method of forming the same

UNITED MICROELECTRONICS CORP32 citations94
US9123659B1Sep 1, 2015

Method for manufacturing finFET device

UNITED MICROELECTRONICS CORP30 citations94
US9142641B1Sep 22, 2015

Method for manufacturing finFET

UNITED MICROELECTRONICS CORP21 citations93
US9704737B2Jul 11, 2017

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP10 citations84
US9559164B2Jan 31, 2017

Nanowire transistor device and method for manufacturing nanowire transistor device

UNITED MICROELECTRONICS CORP9 citations84
US9552978B1Jan 24, 2017

Method of decreasing fin bending

UNITED MICROELECTRONICS CORP11 citations84
US9502410B1Nov 22, 2016

Semiconductor structure and manufacturing method thereof

UNITED MICROELECTRONICS CORP13 citations84
US9484263B1Nov 1, 2016

Method of removing a hard mask on a gate

UNITED MICROELECTRONICS CORP8 citations84
US9455194B1Sep 27, 2016

Method for fabricating semiconductor device

UNITED MICROELECTRONICS CORP7 citations84
US9054187B2Jun 9, 2015

Semiconductor structure

UNITED MICROELECTRONICS CORP8 citations84
US8592271B2Nov 26, 2013

Metal-gate CMOS device and fabrication method thereof

UNITED MICROELECTRONICS CORP7 citations84
US12027600B2Jul 2, 2024

Nanowire transistor and method for fabricating the same

UNITED MICROELECTRONICS CORP1 citations73
US10643997B2May 5, 2020

Semiconductor device with metal gates

UNITED MICROELECTRONICS CORP2 citations73
US10062770B2Aug 28, 2018

Complementary metal oxide semiconductor field effect transistor, metal oxide semiconductor field effect transistor and manufacturing method thereof

UNITED MICROELECTRONICS CORP3 citations73
US10056467B2Aug 21, 2018

Semiconductor fin structure and method of forming the same

UNITED MICROELECTRONICS CORP2 citations73
US9947792B2Apr 17, 2018

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP3 citations73
US9847402B2Dec 19, 2017

Method of using polysilicon as stop layer in a replacement metal gate process

UNITED MICROELECTRONICS CORP2 citations73
US9786662B1Oct 10, 2017

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP2 citations73
US9754938B1Sep 5, 2017

Semiconductor device and method of fabricating the same

UNITED MICROELECTRONICS CORP3 citations73
US9653290B2May 16, 2017

Method for manufacturing nanowire transistor device

UNITED MICROELECTRONICS CORP3 citations73
US9627268B2Apr 18, 2017

Method for fabricating semiconductor device

UNITED MICROELECTRONICS CORP5 citations73
US9536792B2Jan 3, 2017

Complementary metal oxide semiconductor field effect transistor, metal oxide semiconductor field effect transistor and manufacturing method thereof

UNITED MICROELECTRONICS CORP3 citations73
US9508715B1Nov 29, 2016

Semiconductor structure

UNITED MICROELECTRONICS CORP3 citations73
US9384978B1Jul 5, 2016

Method of forming trenches

UNITED MICROELECTRONICS CORP3 citations73
US9105685B2Aug 11, 2015

Method of forming shallow trench isolation structure

UNITED MICROELECTRONICS CORP5 citations73
US9076870B2Jul 7, 2015

Method for forming fin-shaped structure

UNITED MICROELECTRONICS CORP4 citations73
US11227944B2Jan 18, 2022

HEMT and method of fabricating the same

UNITED MICROELECTRONICS CORP2 citations72
US10868148B2Dec 15, 2020

Rinse process after forming fin-shaped structure

UNITED MICROELECTRONICS CORP3 citations72
US9653603B1May 16, 2017

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP2 citations72
US10032672B1Jul 24, 2018

Method of fabricating a semiconductor device having contact structures

UNITED MICROELECTRONICS CORP3 citations71
US9268896B1Feb 23, 2016

Method of forming a photomask

UNITED MICROELECTRONICS CORP4 citations71
US10211313B2Feb 19, 2019

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP3 citations70
US12289088B2Apr 29, 2025

Surface acoustic wave device and method for fabricating the same

UNITED MICROELECTRONICS CORP1 citations64
US11495627B2Nov 8, 2022

Single photon avalanche diode fabricated on a silicon-on-insulator substrate

UNITED MICROELECTRONICS CORP0 citations63
US9006091B2Apr 14, 2015

Method of forming semiconductor device having metal gate

UNITED MICROELECTRONICS CORP2 citations63
US12426385B2Sep 23, 2025

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP0 citations62
US12348214B2Jul 1, 2025

Surface acoustic wave device and method for fabricating the same

UNITED MICROELECTRONICS CORP0 citations62
US12302608B2May 13, 2025

Nanowire transistor and method for fabricating the same

UNITED MICROELECTRONICS CORP0 citations62
US12114508B2Oct 8, 2024

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP0 citations62

TSAI SHIH-HUNG

4 patents

FU SSU-I

2 patents

CHEN YING-TSUNG

2 patents

LIU AN-CHI

1 patent

LIN CHIEN-LIANG

1 patent

Showing the top 50 of 90 patents by PatentIndex Score.