Inventor
TSAI SHIH-HUNG
TW90 patents
⚠️ This page may combine multiple inventors who share the name “TSAI SHIH-HUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
40 patentsUS9530778B1Dec 27, 2016
Semiconductor devices having metal gate and method for manufacturing semiconductor devices having metal gate
UNITED MICROELECTRONICS CORP40 citations94
US9349833B1May 24, 2016
Semiconductor device and method of forming the same
UNITED MICROELECTRONICS CORP32 citations94
US9123659B1Sep 1, 2015
Method for manufacturing finFET device
UNITED MICROELECTRONICS CORP30 citations94
US9142641B1Sep 22, 2015
Method for manufacturing finFET
UNITED MICROELECTRONICS CORP21 citations93
US9704737B2Jul 11, 2017
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP10 citations84
US9559164B2Jan 31, 2017
Nanowire transistor device and method for manufacturing nanowire transistor device
UNITED MICROELECTRONICS CORP9 citations84
US9552978B1Jan 24, 2017
Method of decreasing fin bending
UNITED MICROELECTRONICS CORP11 citations84
US9502410B1Nov 22, 2016
Semiconductor structure and manufacturing method thereof
UNITED MICROELECTRONICS CORP13 citations84
US9484263B1Nov 1, 2016
Method of removing a hard mask on a gate
UNITED MICROELECTRONICS CORP8 citations84
US9455194B1Sep 27, 2016
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP7 citations84
US9054187B2Jun 9, 2015
Semiconductor structure
UNITED MICROELECTRONICS CORP8 citations84
US8592271B2Nov 26, 2013
Metal-gate CMOS device and fabrication method thereof
UNITED MICROELECTRONICS CORP7 citations84
US12027600B2Jul 2, 2024
Nanowire transistor and method for fabricating the same
UNITED MICROELECTRONICS CORP1 citations73
US10643997B2May 5, 2020
Semiconductor device with metal gates
UNITED MICROELECTRONICS CORP2 citations73
US10062770B2Aug 28, 2018
Complementary metal oxide semiconductor field effect transistor, metal oxide semiconductor field effect transistor and manufacturing method thereof
UNITED MICROELECTRONICS CORP3 citations73
US10056467B2Aug 21, 2018
Semiconductor fin structure and method of forming the same
UNITED MICROELECTRONICS CORP2 citations73
US9947792B2Apr 17, 2018
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations73
US9847402B2Dec 19, 2017
Method of using polysilicon as stop layer in a replacement metal gate process
UNITED MICROELECTRONICS CORP2 citations73
US9786662B1Oct 10, 2017
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP2 citations73
US9754938B1Sep 5, 2017
Semiconductor device and method of fabricating the same
UNITED MICROELECTRONICS CORP3 citations73
US9653290B2May 16, 2017
Method for manufacturing nanowire transistor device
UNITED MICROELECTRONICS CORP3 citations73
US9627268B2Apr 18, 2017
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP5 citations73
US9536792B2Jan 3, 2017
Complementary metal oxide semiconductor field effect transistor, metal oxide semiconductor field effect transistor and manufacturing method thereof
UNITED MICROELECTRONICS CORP3 citations73
US9508715B1Nov 29, 2016
Semiconductor structure
UNITED MICROELECTRONICS CORP3 citations73
US9384978B1Jul 5, 2016
Method of forming trenches
UNITED MICROELECTRONICS CORP3 citations73
US9105685B2Aug 11, 2015
Method of forming shallow trench isolation structure
UNITED MICROELECTRONICS CORP5 citations73
US9076870B2Jul 7, 2015
Method for forming fin-shaped structure
UNITED MICROELECTRONICS CORP4 citations73
US11227944B2Jan 18, 2022
HEMT and method of fabricating the same
UNITED MICROELECTRONICS CORP2 citations72
US10868148B2Dec 15, 2020
Rinse process after forming fin-shaped structure
UNITED MICROELECTRONICS CORP3 citations72
US9653603B1May 16, 2017
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP2 citations72
US10032672B1Jul 24, 2018
Method of fabricating a semiconductor device having contact structures
UNITED MICROELECTRONICS CORP3 citations71
US9268896B1Feb 23, 2016
Method of forming a photomask
UNITED MICROELECTRONICS CORP4 citations71
US10211313B2Feb 19, 2019
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP3 citations70
US12289088B2Apr 29, 2025
Surface acoustic wave device and method for fabricating the same
UNITED MICROELECTRONICS CORP1 citations64
US11495627B2Nov 8, 2022
Single photon avalanche diode fabricated on a silicon-on-insulator substrate
UNITED MICROELECTRONICS CORP0 citations63
US9006091B2Apr 14, 2015
Method of forming semiconductor device having metal gate
UNITED MICROELECTRONICS CORP2 citations63
US12426385B2Sep 23, 2025
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US12348214B2Jul 1, 2025
Surface acoustic wave device and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US12302608B2May 13, 2025
Nanowire transistor and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
US12114508B2Oct 8, 2024
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations62
TSAI SHIH-HUNG
4 patentsUS8470714B1Jun 25, 2013
Method of forming fin structures in integrated circuits
TSAI SHIH-HUNG44 citations93
US8466502B2Jun 18, 2013
Metal-gate CMOS device
TSAI SHIH-HUNG17 citations92
US8441072B2May 14, 2013
Non-planar semiconductor structure and fabrication method thereof
TSAI SHIH-HUNG27 citations92
US8722501B2May 13, 2014
Method for manufacturing multi-gate transistor device
TSAI SHIH-HUNG8 citations84
FU SSU-I
2 patentsCHEN YING-TSUNG
2 patentsLIU AN-CHI
1 patentLIN CHIEN-LIANG
1 patentShowing the top 50 of 90 patents by PatentIndex Score.