Inventor
LEE SUK-JOO
KR24 patents
⚠️ This page may combine multiple inventors who share the name “LEE SUK-JOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
18 patentsUS8026044B2Sep 27, 2011
Method of forming fine patterns of semiconductor device
SAMSUNG ELECTRONICS CO LTD22 citations91
US6571384B2May 27, 2003
Method of forming fine patterns on semiconductor device
SAMSUNG ELECTRONICS CO LTD19 citations90
US7892982B2Feb 22, 2011
Method for forming fine patterns of a semiconductor device using a double patterning process
SAMSUNG ELECTRONICS CO LTD19 citations84
US8952423B2Feb 10, 2015
Semiconductor device having decoupling capacitors and dummy transistors
SAMSUNG ELECTRONICS CO LTD7 citations83
US9557637B2Jan 31, 2017
Method of designing patterns of semiconductor devices in consideration of pattern density
SAMSUNG ELECTRONICS CO LTD2 citations66
US7807318B2Oct 5, 2010
Reflective photomask and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD3 citations63
US8778598B2Jul 15, 2014
Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion
SAMSUNG ELECTRONICS CO LTD3 citations62
US7787301B2Aug 31, 2010
Flash memory device using double patterning technology and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD4 citations62
US7452825B2Nov 18, 2008
Method of forming a mask structure and method of forming a minute pattern using the same
SAMSUNG ELECTRONICS CO LTD5 citations62
US7940373B2May 10, 2011
Compensating masks, multi-optical systems using the masks, and methods of compensating for 3-D mask effect using the same
SAMSUNG ELECTRONICS CO LTD2 citations60
US7799490B2Sep 21, 2010
Optical masks and methods for measuring aberration of a beam
SAMSUNG ELECTRONICS CO LTD0 citations52
US7670725B2Mar 2, 2010
Optical masks and methods for measuring aberration of a beam
SAMSUNG ELECTRONICS CO LTD0 citations52
US9470972B2Oct 18, 2016
Mask for photolithography, method for fabricating the same and method for manufacturing semiconductor device using the mask
SAMSUNG ELECTRONICS CO LTD0 citations51
US7403276B2Jul 22, 2008
Photomask for measuring lens aberration, method of its manufacture, and method of its use
SAMSUNG ELECTRONICS CO LTD0 citations51
US9570364B2Feb 14, 2017
Method of detecting focus shift in lithography process, method of analyzing error of transferred pattern using the same and method of manufacturing semiconductor device using the methods
SAMSUNG ELECTRONICS CO LTD0 citations49
US7842450B2Nov 30, 2010
Method of forming a semiconductor device
SAMSUNG ELECTRONICS CO LTD0 citations49
US6673706B2Jan 6, 2004
Method of forming a pattern using a photoresist without exposing the photoresist and silicidation method incorporating the same
SAMSUNG ELECTRONICS CO LTD1 citations47
US9941172B2Apr 10, 2018
Method for fabricating semiconductor device including a via hole in a mask pattern
SAMSUNG ELECTRONICS CO LTD1 citations46