Inventor
ILIEW RUMEN
DE4 patents
Patents
4 patentsUS10001631B2Jun 19, 2018
Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element
ZEISS CARL SMT GMBH6 citations70
US9709770B2Jul 18, 2017
Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus
ZEISS CARL SMT GMBH0 citations50
US9348234B2May 24, 2016
Microlithographic apparatus
ZEISS CARL SMT GMBH1 citations50
US9470872B2Oct 18, 2016
Reflective optical element
ZEISS CARL SMT GMBH1 citations48