Inventor

WANG SHIH-CHE

TW18 patents

⚠️ This page may combine multiple inventors who share the name “WANG SHIH-CHE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WANG SHIH-CHE

TAIWAN SEMICONDUCTOR MFG CO LTD

System and method for supplying and dispensing bubble-free photolithography chemical solutions

Protection layer on low thermal expansion material (LTEM) substrate of extreme ultraviolet (EUV) mask

System and method for supplying and dispensing bubble-free photolithography chemical solutions

Method and apparatus for solvent recycling

Method and apparatus for coating photo resist over a substrate

Method and apparatus for coating photo resist over a substrate

Methods of defect inspection

Methods of defect inspection

System and method for supplying and dispensing bubble-free photolithography chemical solutions

Method and apparatus for coating photo resist over a substrate

Lithography patterning with sub-resolution assistant patterns and off-axis illumination

TAIWAN SEMICONDUCTOR MFG

Structure design and fabrication on photomask for contact hole manufacturing process window enhancement

Micro-etching method to replicate alignment marks for semiconductor wafer photolithography

Cross quadrupole double lithography method using two complementary apertures

UNITED MICROELECTRONICS CORP

Alignment mark design

Method to form an alignment mark

WANG HSIEN-CHENG

Cross quadrupole double lithography method and apparatus for semiconductor device fabrication using two apertures

TAIWAN SEMICONDUCTOR MFG COMPANY LTD

Method and apparatus for reducing solvent consumption