Inventor

YOO CHIU-SHAN

TW2 patents

Patents

2 patents

US7314689B2Jan 1, 2008

System and method for processing masks with oblique features

TAIWAN SEMICONDUCTOR MFG2 citations60

US7251015B2Jul 31, 2007

Photolithography mask critical dimension metrology system and method

TAIWAN SEMICONDUCTOR MFG2 citations51