Inventor
KAWAKAMI SHINICHIRO
JP19 patents
⚠️ This page may combine multiple inventors who share the name “KAWAKAMI SHINICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
16 patentsUS12002676B2Jun 4, 2024
Method for forming mask pattern, storage medium, and apparatus for processing substrate
TOKYO ELECTRON LTD1 citations73
US11604415B2Mar 14, 2023
Substrate processing method, substrate processing apparatus, and computer readable recording medium
TOKYO ELECTRON LTD2 citations73
US11508580B2Nov 22, 2022
Method for forming mask pattern, storage medium, and apparatus for processing substrate
TOKYO ELECTRON LTD4 citations73
US10656526B2May 19, 2020
Substrate treatment method and thermal treatment apparatus
TOKYO ELECTRON LTD2 citations71
US10025190B2Jul 17, 2018
Substrate treatment system
TOKYO ELECTRON LTD2 citations71
US10139732B2Nov 27, 2018
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD4 citations70
US10732508B2Aug 4, 2020
Coating and developing method and coating and developing apparatus
TOKYO ELECTRON LTD2 citations69
US10394125B2Aug 27, 2019
Coating and developing method and coating and developing apparatus
TOKYO ELECTRON LTD3 citations69
US12476110B2Nov 18, 2025
Substrate processing module
TOKYO ELECTRON LTD0 citations62
US12572077B2Mar 10, 2026
Heat treatment apparatus and heat treatment method
TOKYO ELECTRON LTD0 citations58
US12298668B2May 13, 2025
Heat treatment apparatus and heat treatment method
TOKYO ELECTRON LTD0 citations58
US11036140B2Jun 15, 2021
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD0 citations50
US10955743B2Mar 23, 2021
Substrate processing apparatus, substrate processing method and computer-readable recording medium
TOKYO ELECTRON LTD0 citations49
US9810987B2Nov 7, 2017
Substrate treatment method, computer storage medium and substrate treatment system
TOKYO ELECTRON LTD0 citations41
US10101669B2Oct 16, 2018
Exposure apparatus, resist pattern forming method, and storage medium
TOKYO ELECTRON LTD0 citations40
US9748100B2Aug 29, 2017
Substrate processing method, storage medium and substrate processing system
TOKYO ELECTRON LTD0 citations35