Inventor
YAMOTO HISAYOSHI
JP30 patents
⚠️ This page may combine multiple inventors who share the name “YAMOTO HISAYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SONY CORP
26 patentsUS6653212B1Nov 25, 2003
Method and apparatus for thin-film deposition, and method of manufacturing thin-film semiconductor device
SONY CORP138 citations98
US6372558B1Apr 16, 2002
Electrooptic device, driving substrate for electrooptic device, and method of manufacturing the device and substrate
SONY CORP134 citations98
US6346718B1Feb 12, 2002
Electro-optic device, drive substrate for electro-optic device and method of manufacturing the same
SONY CORP154 citations98
US6103558AAug 15, 2000
Process for producing electrooptical apparatus and process for producing driving substrate for electrooptical apparatus
SONY CORP86 citations96
US6504215B1Jan 7, 2003
Electro-optical apparatus having a display section and a peripheral driving circuit section
SONY CORP57 citations95
US7098085B2Aug 29, 2006
Method and apparatus for forming a thin semiconductor film, method and apparatus for producing a semiconductor device, and electro-optical apparatus
SONY CORP32 citations93
US6709512B2Mar 23, 2004
Method of growing a polycrystalline silicon layer, method of growing a single crystal silicon layer and catalytic CVD apparatus
SONY CORP36 citations93
US6351010B1Feb 26, 2002
Electrooptical device, substrate for driving electrooptical device and methods for making the same
SONY CORP38 citations93
US4702937AOct 27, 1987
Method for manufacturing a semiconductor device
SONY CORP25 citations93
US6767755B2Jul 27, 2004
Method of producing electrooptical device and method of producing driving substrate for driving electrooptical device
SONY CORP18 citations92
US6645835B1Nov 11, 2003
Semiconductor film forming method and manufacturing method for semiconductor devices thereof
SONY CORP42 citations92
US6492190B2Dec 10, 2002
Method of producing electrooptical device and method of producing driving substrate for driving electrooptical device
SONY CORP32 citations92
US6399429B1Jun 4, 2002
Method of forming monocrystalline silicon layer, method for manufacturing semiconductor device, and semiconductor device
SONY CORP36 citations92
US6355952B1Mar 12, 2002
Capacitor having ferroelectric film and multiple layers of insulating and protective films for nonvolatile memory cell
SONY CORP36 citations92
US6090657AJul 18, 2000
Method of manufacturing capacitor having ferroelectric film for nonvolatile memory cell
SONY CORP20 citations92
US5162892ANov 10, 1992
Semiconductor device with polycrystalline silicon active region and hydrogenated passivation layer
SONY CORP50 citations92
US4001762AJan 4, 1977
Thin film resistor
SONY CORP37 citations91
US6521525B2Feb 18, 2003
Electro-optic device, drive substrate for electro-optic device and method of manufacturing the same
SONY CORP14 citations83
US4302763ANov 24, 1981
Semiconductor device
SONY CORP27 citations81
US4176372ANov 27, 1979
Semiconductor device having oxygen doped polycrystalline passivation layer
SONY CORP28 citations81
US4014037AMar 22, 1977
Semiconductor device
SONY CORP24 citations81
US6376340B1Apr 23, 2002
Methods for forming polycrystalline silicon film
SONY CORP13 citations74
US6825070B2Nov 30, 2004
Electro-optical apparatus, driving substrate for an electro-optical apparatus and method of manufacturing them
SONY CORP8 citations73
US7095082B2Aug 22, 2006
Electrooptical device, substrate for driving electrooptical device and methods for making the same
SONY CORP4 citations63
US6500256B2Dec 31, 2002
Single crystal silicon layer, its epitaxial growth method and semiconductor device
SONY CORP2 citations63
US6185031B1Feb 6, 2001
Optical switching method and optical switching apparatus
SONY CORP1 citations46