Inventor
KOOS DANIEL
US2 patents
Patents
2 patentsUS6099604AAug 8, 2000
Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto
MICRON TECHNOLOGY INC131 citations96
US6312486B1Nov 6, 2001
Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto
MICRON TECHNOLOGY INC50 citations94