Inventor
LIN DAVID (TAWEI)
US4 patents
Patents
4 patentsUS11999876B2Jun 4, 2024
Bulk ruthenium chemical mechanical polishing composition
FUJIFILM ELECTRONIC MAT USA INC0 citations58
US11505718B2Nov 22, 2022
Barrier ruthenium chemical mechanical polishing slurry
FUJIFILM ELECTRONIC MAT USA INC0 citations58
US11279850B2Mar 22, 2022
Bulk ruthenium chemical mechanical polishing composition
FUJIFILM ELECTRONIC MAT USA INC0 citations58
US11034859B2Jun 15, 2021
Barrier ruthenium chemical mechanical polishing slurry
FUJIFILM ELECTRONIC MAT USA INC0 citations58