Inventor
OSAWA TETSU
JP13 patents
Patents
13 patentsUS6080965AJun 27, 2000
Single-substrate-heat-treatment apparatus in semiconductor processing system
TOKYO ELECTRON LTD74 citations95
US5820367AOct 13, 1998
Boat for heat treatment
TOKYO ELECTRON LTD64 citations95
US6259061B1Jul 10, 2001
Vertical-heat-treatment apparatus with movable lid and compensation heater movable therewith
TOKYO ELECTRON LTD37 citations92
US6123429ASep 26, 2000
Light source device
TOKYO ELECTRON LTD23 citations92
US6510365B1Jan 21, 2003
Carrier system positioning method
TOKYO ELECTRON LTD57 citations91
US6372084B2Apr 16, 2002
Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate
TOKYO ELECTRON LTD42 citations91
US5357115AOct 18, 1994
Processing method for wafers
TOKYO ELECTRON LTD35 citations90
US5248886ASep 28, 1993
Processing system
TOKYO ELECTRON LTD36 citations90
US6797111B2Sep 28, 2004
Plasma processing apparatus
TOKYO ELECTRON LTD17 citations83
US7629033B2Dec 8, 2009
Plasma processing method for forming a silicon nitride film on a silicon oxide film
TOKYO ELECTRON LTD11 citations82
US6656322B2Dec 2, 2003
Plasma processing apparatus
TOKYO ELECTRON LTD17 citations82
US6675737B2Jan 13, 2004
Plasma processing apparatus
TOKYO ELECTRON LTD10 citations74
US7393172B1Jul 1, 2008
Untreated body transfer device and semiconductor manufacturing device with the untreated body transfer device
TOKYO ELECTRON LTD5 citations61