Inventor
IMADA TADAHIRO
JP45 patents
⚠️ This page may combine multiple inventors who share the name “IMADA TADAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
27 patentsUS10301989B2May 28, 2019
Microwave applicator, exhaust gas purifier, heater, and chemical reactor
FUJITSU LTD14 citations86
US9312373B2Apr 12, 2016
Compound semiconductor device and manufacturing method of the same
FUJITSU LTD6 citations84
US10603617B2Mar 31, 2020
Microwave irradiation apparatus and exhaust gas purification apparatus
FUJITSU LTD2 citations73
US10577992B2Mar 3, 2020
Microwave heating apparatus and exhaust gas purification apparatus
FUJITSU LTD3 citations73
US10576406B2Mar 3, 2020
Exhaust purification device, internal combustion device, and power generation device
FUJITSU LTD3 citations73
US9608083B2Mar 28, 2017
Semiconductor device
FUJITSU LTD2 citations73
US9547320B2Jan 17, 2017
Power supply circuit and power supply apparatus
FUJITSU LTD2 citations73
US10270406B2Apr 23, 2019
Power amplifier, semiconductor integrated circuit, and method of controlling the power amplifier
FUJITSU LTD2 citations72
US9077336B2Jul 7, 2015
Transistor control circuit and power supply device
FUJITSU LTD2 citations63
US10876458B2Dec 29, 2020
Microwave irradiation device, exhaust purification apparatus, automobile and management system
FUJITSU LTD1 citations62
US10626777B2Apr 21, 2020
Exhaust purification device and vehicle
FUJITSU LTD0 citations52
US10453948B2Oct 22, 2019
Semiconductor device which comprises transistor and diode
FUJITSU LTD0 citations52
US10221739B2Mar 5, 2019
Particulate filter and exhaust gas purifier
FUJITSU LTD0 citations52
US10108263B2Oct 23, 2018
Input apparatus including input cancelling circuit
FUJITSU LTD0 citations52
US9647527B2May 9, 2017
Power supply circuit and power factor correction circuit
FUJITSU LTD0 citations52
US9515063B2Dec 6, 2016
Compound semiconductor device and manufacturing method of the same
FUJITSU LTD0 citations52
US9337326B2May 10, 2016
Compound semiconductor device and method for fabricating the same
FUJITSU LTD0 citations52
US9190507B2Nov 17, 2015
Semiconductor device
FUJITSU LTD0 citations52
US9082756B2Jul 14, 2015
Semiconductor device and power source device
FUJITSU LTD0 citations52
US8941093B2Jan 27, 2015
Compound semiconductor device and manufacturing method thereof
FUJITSU LTD0 citations52
US7928536B2Apr 19, 2011
Roughness reducing film at interface, materials for forming roughness reducing film at interface, wiring layer and semiconductor device using the same, and method for manufacturing semiconductor device
FUJITSU LTD0 citations52
US7830013B2Nov 9, 2010
Material for forming adhesion reinforcing layer, adhesion reinforcing layer, semiconductor device, and manufacturing method thereof
FUJITSU LTD1 citations52
US7470975B2Dec 30, 2008
Composition for forming insulation film, insulation film for semiconductor device, and fabrication method and semiconductor device thereof
FUJITSU LTD0 citations52
US10850221B2Dec 1, 2020
Fine particle detector and exhaust gas purification apparatus
FUJITSU LTD0 citations42
US10526944B2Jan 7, 2020
Filter regeneration device, filter plugging detection device, exhaust gas treatment apparatus, and filter plugging determination method
FUJITSU LTD0 citations42
US9240472B2Jan 19, 2016
Semiconductor device, PFC circuit, power supply device, and amplifier
FUJITSU LTD0 citations42
US9564527B2Feb 7, 2017
Semiconductor device and manufacturing method of semiconductor device
FUJITSU LTD0 citations41
IMADA TADAHIRO
12 patentsUS8198653B2Jun 12, 2012
Compound semiconductor device and manufacturing method of the same
IMADA TADAHIRO18 citations92
US8872232B2Oct 28, 2014
Compound semiconductor device and method for manufacturing the same
IMADA TADAHIRO9 citations84
US8765554B2Jul 1, 2014
Compound semiconductor device and method for manufacturing the same
IMADA TADAHIRO8 citations84
US9166030B2Oct 20, 2015
Compound semiconductor device and method for fabricating
IMADA TADAHIRO2 citations62
US8449787B2May 28, 2013
Method for wet etching while forming interconnect trench in insulating film
IMADA TADAHIRO2 citations62
US8164166B2Apr 24, 2012
Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device
IMADA TADAHIRO4 citations61
US8716748B2May 6, 2014
Semiconductor device and method of manufacturing the same, and power supply apparatus
IMADA TADAHIRO2 citations60
US8404584B2Mar 26, 2013
Method of manufacturing semiconductor device
IMADA TADAHIRO4 citations60
US8941116B2Jan 27, 2015
Semiconductor device and method of manufacturing the same
IMADA TADAHIRO0 citations52
US8735942B2May 27, 2014
Compound semiconductor device and manufacturing method of the same
IMADA TADAHIRO0 citations52
US8618577B2Dec 31, 2013
Compound semiconductor device and manufacturing method thereof
IMADA TADAHIRO0 citations41
US8089138B2Jan 3, 2012
Surface-hydrophobicized film, material for formation of surface-hydrophobicized film, wiring layer, semiconductor device and process for producing semiconductor device
IMADA TADAHIRO0 citations41
KOBAYASHI YASUSHI
2 patentsUS8716209B2May 6, 2014
Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device
KOBAYASHI YASUSHI2 citations61
US8431464B2Apr 30, 2013
Process for producing silicic coating, silicic coating and semiconductor device
KOBAYASHI YASUSHI2 citations61