Inventor

NOZAKI KOJI

JP83 patents

⚠️ This page may combine multiple inventors who share the name “NOZAKI KOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NOZAKI KOJI

FUJITSU LTD

Chemically amplified resist compositions and process for the formation of resist patterns

Chemically amplified resist compositions and process for the formation of resist patterns

Resist cover film-forming material, process for forming resist pattern, semiconductor device and process for manufacturing the same

Chemically amplified resist compositions and process for the formation of resist patterns

Chemically amplified resist compositions and process for the formation of resist patterns

Negative-type resist composition and process for forming resist patterns

Resist composition and process for forming resist pattern

Photoresist composition of 1-(1&#39;-cyanoethenyl)adamantane

Dithiane derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition

Polymer compound for a chemical amplification resist and a fabrication process of a semiconductor device using such a chemical amplification resist

Negative resist composition, process for forming resist patterns, and process for manufacturing electron device

Resist composition suitable for short wavelength exposure and resist pattern forming method

Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof

Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof

Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices

Resist composition, a process for forming a resist pattern and a process for manufacturing a semiconductor device

Resist composition and process for forming resist pattern

Method for manufacturing magnetoresistance head

Chemically amplified resist composition and process for forming resist pattern using same

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same

Resist pattern-improving material and a method for preparing a resist pattern by using the same

Biodegradable resin composition, filler therefor and molded article thereof

Chemically amplified resist material and patterning method using same

Acid sensitive copolymer, resist composition and resist pattern forming method

Chemical amplification resist compositions and process for the formation of resist patterns

Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same

Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device

Gate electrode and manufacturing method thereof, and semiconductor device and manufacturing method thereof

Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices

Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices

Resist compositions for forming resist patterns

Resist compositions and process for the formation of resist patterns

Apparatus for producing semiconductor device

Apparatus for producing semiconductor device

Resist pattern thickening material, method for forming resist pattern, semiconductor device and method for manufacturing the same

Manufacturing process of semiconductor device

Monomer, resin, resist composition using the resin, and method producing semiconductor device using the resist composition

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for producing the same

Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same

Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof

Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device

Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same

NOZAKI KOJI

Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition

Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition

Resist pattern swelling material, and method for patterning using same

CENTRAL GLASS CO LTD

Lithium secondary battery using hydric boron carbonitride as electrode material

Aminotriazine polymers and method of preparing same

HITACHI CONSTRUCTION MACHINERY

Safety device for hydraulic closed circuit

Hydraulic drive circuit system

ORIHASHI YOSHIHIKO

Pick-up style utility vehicle with expandable cargo bed

Photoresist composition of 1-(1'-cyanoethenyl)adamantane